Title:
METHOD FOR TRANSMISSION INCREASE AT A POSITION ON A PHOTO MASK REPAIRED WITH IONIC RADIATION BY MEANS OF THERMAL DESORPTION
Document Type and Number:
WIPO Patent Application WO2003036385
Kind Code:
A3
Abstract:
According to the invention, an improved method for repairing opaque defects on a photomask can be achieved, whereby firstly an opaque repair is carried out using an ion beam with gallium ions and then the gallium ions are removed from the quartz blank by thermal desorption by means of an incineration process.
Inventors:
LUDWIG RALF (DE)
SCHOPP MICHAEL (DE)
WIEDENMANN ULRICH (DE)
SCHOPP MICHAEL (DE)
WIEDENMANN ULRICH (DE)
Application Number:
PCT/EP2002/011688
Publication Date:
January 08, 2004
Filing Date:
October 18, 2002
Export Citation:
Assignee:
INFINEON TECHNOLOGIES AG (DE)
LUDWIG RALF (DE)
SCHOPP MICHAEL (DE)
WIEDENMANN ULRICH (DE)
LUDWIG RALF (DE)
SCHOPP MICHAEL (DE)
WIEDENMANN ULRICH (DE)
International Classes:
G03F1/00; (IPC1-7): G03F1/00
Foreign References:
| US6114073A | 2000-09-05 |
Other References:
ZHENG C ET AL: "Optimization of FIB Methods for Phase Shift Mask Defect Repair", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 30, no. 1, 1996, pages 575 - 578, XP004003150, ISSN: 0167-9317
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 26 1 July 2002 (2002-07-01)
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 26 1 July 2002 (2002-07-01)
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