Title:
METHODS OF PRODUCING NANOSCALE HOT EMBOSSED PATTERNS
Document Type and Number:
WIPO Patent Application WO/2022/183298
Kind Code:
A8
Abstract:
A method of producing nanoscale features on a pre-stressed polymer film is described herein. The method includes: imprinting the pre-stressed polymer film with a nanoscale or microscale pattern; constraining the pre-stressed polymer film in a first direction with a first constraint; shrinking the pre-stressed polymer film in a second direction with a first heat treatment process; releasing the first uniaxial constraint; constraining the pre-stressed polymer film in a third direction with a second constraint, the third direction being different than the first direction; shrinking the pre-stressed polymer film in a fourth direction with a second heat treatment process; and releasing the second constraint to produce the nanoscale features on the pre-stressed polymer film.
Inventors:
SELVAGANAPATHY PONNAMBALAM RAVI (CA)
ABOSREE SHADY (CA)
ABOSREE SHADY (CA)
Application Number:
PCT/CA2022/050314
Publication Date:
November 02, 2023
Filing Date:
March 04, 2022
Export Citation:
Assignee:
UNIV MCMASTER (CA)
International Classes:
B29C59/02; B29C61/00; C08J5/18
Attorney, Agent or Firm:
BERESKIN & PARR LLP/S.E.N.C.R.L.S.R.L. (CA)
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