Title:
MONITORING SUBSTRATE PROCESSING USING REFLECTED RADIATION
Document Type and Number:
WIPO Patent Application WO2002035586
Kind Code:
A3
Abstract:
A substrate processing apparatus has a chamber capable of processing a substrate, a radiation source to provide a radiation, a radiation polarizer adapted to polarize the radiation to one or more polarization angles that are selected in relation to an orientation of a feature being processed on the substrate, a radiation detector to detect radiation reflected from the substrate during processing and generate a signal, and a controller to process the signal.
Inventors:
SUI ZHIFENG
SHAN HONGQING
JOHANSSON NILS
NOORBAKHSH HAMID
GUAN YU
FRUM CORIOLAN
YUAN JIE
HSIEH CHANG-LIN
SHAN HONGQING
JOHANSSON NILS
NOORBAKHSH HAMID
GUAN YU
FRUM CORIOLAN
YUAN JIE
HSIEH CHANG-LIN
Application Number:
PCT/US2001/049437
Publication Date:
August 07, 2003
Filing Date:
October 23, 2001
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
H01L21/3065; G01N21/15; G01N21/21; G01N21/71; G01N21/95; G01N21/956; H01J37/32; H01L21/311; H01L21/316; (IPC1-7): H01L21/66; G01N21/21; G01N21/95; G01B11/06
Foreign References:
| EP0756318A1 | 1997-01-29 | |||
| US5552016A | 1996-09-03 | |||
| US6081334A | 2000-06-27 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 14 31 December 1998 (1998-12-31)
BIOLSI P ET AL: "AN ADVANCED ENDPOINT DETECTION SOLUTION FOR <1% OPEN AREAS", SOLID STATE TECHNOLOGY, COWAN PUBL.CORP. WASHINGTON, US, vol. 39, no. 12, 1 December 1996 (1996-12-01), pages 59,61 - 62,64,67, XP000632988, ISSN: 0038-111X
BIOLSI P ET AL: "AN ADVANCED ENDPOINT DETECTION SOLUTION FOR <1% OPEN AREAS", SOLID STATE TECHNOLOGY, COWAN PUBL.CORP. WASHINGTON, US, vol. 39, no. 12, 1 December 1996 (1996-12-01), pages 59,61 - 62,64,67, XP000632988, ISSN: 0038-111X
Download PDF:
Previous Patent: METHOD FOR PROCESSING A WAFER OF INTEGRATED CIRCUITS
Next Patent: METHOD FOR APPLYING A SUBSTRATE
Next Patent: METHOD FOR APPLYING A SUBSTRATE