Title:
NANOFLUID PRODUCTION APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2007/034913
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a nanofluid production apparatus which has a relatively
simple and inexpensive structure, can continuously and stably produce a nanofluid
in a large amount, and is easy to handle. It can be efficiently cleaned, whereby
a considerable reduction in production cost can be attained. [MEANS FOR SOLVING
PROBLEMS] The apparatus (1) for producing a nanofluid containing nanobubbles,
i.e., bubbles having a diameter smaller than 1 µm, comprises: a gas/liquid
mixing chamber (7) having a turbulent-flow formation mechanism for forcibly
mixing a gas and a liquid while causing turbulent flows therein and an ultrafine
ejection opening (20) through which the fluid obtained by the gas/liquid mixing
is discharged outside to yield a nanofluid; gas/liquid feeders 21, 23, ···
which supply the liquid and gas to the gas/liquid mixing chamber (7); a pressurizing
pump (4) which pressurizes the gas and liquid; and a control unit (CR) which controls
the operation of the pressurizing pump (4) and the gas/liquid feeders. The control
unit (CR) controls the gas/liquid feeders and pressurizing pump (4) to conduct
switching between the nanofluid production mode and the cleaning mode in which
the inside of the gas/liquid mixing chamber (7) is cleaned.
Inventors:
WATANABE SADATOSHI (JP)
Application Number:
PCT/JP2006/318846
Publication Date:
March 29, 2007
Filing Date:
September 22, 2006
Export Citation:
Assignee:
WATANABE SADATOSHI (JP)
International Classes:
B01F25/70; A61J3/00; A61L2/18; A61L2/20; B08B3/10; C02F1/68
Foreign References:
| JP2003251384A | 2003-09-09 | |||
| JP2003126665A | 2003-05-07 | |||
| JP2001252546A | 2001-09-18 | |||
| JP2002248329A | 2002-09-03 | |||
| JP2001310120A | 2001-11-06 |
Attorney, Agent or Firm:
YAGUCHI, Taro et al. (8th Floor Ichibancho Central Bldg.,, 22-1, Ichibancho, Chiyoda-k, Tokyo 82, JP)
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