Title:
NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/251063
Kind Code:
A1
Abstract:
Provided is a negative resist film laminate comprising a thermoplastic film, which is a first support body, and a negative resist film, wherein the negative resist film contains (A) an alkali-soluble resin having a phenolic hydroxy group, (B) a plasticizer containing polyester, (C) a photoacid generator, (D) an epoxy compound containing on average four or more epoxy groups per molecule, and (E) a benzotriazole compound and/or an imidazole compound.
Inventors:
HIRANO YOSHINORI (JP)
ASAI SATOSHI (JP)
ASAI SATOSHI (JP)
Application Number:
PCT/JP2021/018421
Publication Date:
December 16, 2021
Filing Date:
May 14, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/20; G03F7/38
Domestic Patent References:
| WO2019111796A1 | 2019-06-13 |
Foreign References:
| JP2015135522A | 2015-07-27 | |||
| JP2018180349A | 2018-11-15 | |||
| JP2016188987A | 2016-11-04 | |||
| JP2017211555A | 2017-11-30 | |||
| JP2017122742A | 2017-07-13 | |||
| JP2011145664A | 2011-07-28 | |||
| JP2019128438A | 2019-08-01 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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