Title:
NEGATIVE-TYPE RESIST COMPOSITION FOR ELECTRON BEAM, AND METHOD FOR FORMATION OF RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2008/038448
Kind Code:
A1
Abstract:
Disclosed is a novel negative-type resist composition for electron beam. Also
disclosed is a method for formation of a resist pattern using the negative-type
resist composition. The negative-type resist composition comprises: (A) at
least one compound selected from the group consisting of a hydrolysate of an alkoxysilane
compound represented by the general formula (I) and a condensation product of
the alkoxysilane compound; and (B) a nonionic acid generator. R1
n-Si(OR2)4-n
(I) wherein R1 represents a hydrogen atom or an organic group having
a valency of 1; R2 represents an organic group having a valency of 1;
and n represents an integer of 1 to 3.
Inventors:
ISHIKAWA KIYOSHI (JP)
SAKAMOTO YOSHINORI (JP)
SAKAMOTO YOSHINORI (JP)
Application Number:
PCT/JP2007/064002
Publication Date:
April 03, 2008
Filing Date:
July 13, 2007
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
ISHIKAWA KIYOSHI (JP)
SAKAMOTO YOSHINORI (JP)
ISHIKAWA KIYOSHI (JP)
SAKAMOTO YOSHINORI (JP)
International Classes:
G03F7/075; G03F7/004; H01L21/027
Foreign References:
| JP2006154037A | 2006-06-15 | |||
| JP2004190036A | 2004-07-08 | |||
| JPH10324748A | 1998-12-08 | |||
| JP2005266474A | 2005-09-29 |
Attorney, Agent or Firm:
TANAI, Sumio et al. (Yaesu Chuo-k, Tokyo 53, JP)
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