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Patent Searching and Data


Title:
NEW COMPOSITION AND TREATING AGENT
Document Type and Number:
WIPO Patent Application WO/1998/033854
Kind Code:
A1
Abstract:
A composition comprising (A) a copolymer comprising (I) constituent units derived from a monomer having a fluoroalkyl group and a carbon-to-carbon double bond, (II) optional constituent units derived from a fluorine-free monomer having at least two urethane or urea bonds and a carbon-to-carbon double bond, (III) optional constituent units derived from a monomer having a glass transition temperature (Tg) of not higher than 50 �C, (IV) optional constituent units derived from a monomer having a hydrophilic group and a carbon-to-carbon double bond, and (V) optional constituent units derived from a monomer having a chlorine atom and a carbon-to-carbon double bond, and (B) a film-forming assistant. The composition is capable of imparting high water-repellent and oil-repellent properties after drying at room temperature (0 to 30 �C) without necessitating the heat treatment step.

Inventors:
YAMANA MASAYUKI (JP)
YAMAMOTO IKUO (JP)
KASHIWAGI MASATO (JP)
KUBOTA KOJI (JP)
Application Number:
PCT/JP1998/000334
Publication Date:
August 06, 1998
Filing Date:
January 28, 1998
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
YAMANA MASAYUKI (JP)
YAMAMOTO IKUO (JP)
KASHIWAGI MASATO (JP)
KUBOTA KOJI (JP)
International Classes:
C08L75/04; C08F220/22; C08F220/26; C08F220/36; C08F290/06; C08K5/00; C08K5/06; C08K5/10; C08L101/02; C09D201/02; C09K3/18; D06M13/02; D06M13/144; D06M13/165; D06M13/17; D06M13/184; D06M13/224; D06M13/236; D06M13/322; D06M13/325; D06M13/50; D06M13/503; D06M13/507; D06M13/51; D06M13/513; D06M15/277; D06M15/285; (IPC1-7): C08L101/02; C08F220/22; C08F220/26; C08F220/36; C08K5/00; C09D201/02; C09K3/18
Foreign References:
JPH0215695A1990-01-19
JPH02214791A1990-08-27
JPH05214197A1993-08-24
JPH06157870A1994-06-07
JPH04272988A1992-09-29
JPH07118596A1995-05-09
JPH0987457A1997-03-31
Other References:
See also references of EP 0964032A4
Attorney, Agent or Firm:
Aoyama, Tamotsu (IMP Building 3-7, Shiromi 1-chome, Chuo-k, Osaka-shi Osaka 540, JP)
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