Title:
ORGANIC SOLID-STATE IMAGING ELEMENT AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/045540
Kind Code:
A1
Abstract:
[Problem] To obtain an organic solid-state imaging element on which a high-resolution pattern can be formed and that can be fabricated with high yield. [Solution] A solid-state imaging element (1) provided with the following: a matrix of pixel electrodes (12) formed on a substrate (10); a common film consisting of an organic photoelectric-conversion layer (13), a counter-electrode layer (14), and a transparent insulating layer (15) layered in that order on top of the pixel electrodes (12); and a frame region (40) obtained by extending the organic photoelectric-conversion layer (13), the counter-electrode layer (14), and the transparent insulating layer (15) at least 200 µm from the edges of an effective-pixel region (30) in which the pixel electrodes (12) are formed. The outer wall (40a) of the frame region (40), where the organic photoelectric-conversion layer (13), the counter-electrode layer (14), and the transparent insulating layer (15) were removed by etching, is covered by a protective film (16).
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Inventors:
ASANO HIDEKI (JP)
Application Number:
PCT/JP2013/005295
Publication Date:
March 27, 2014
Filing Date:
September 06, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L27/146; H01L27/14; H01L31/10
Domestic Patent References:
| WO2011027745A1 | 2011-03-10 |
Foreign References:
| JP2007012796A | 2007-01-18 | |||
| US20090134485A1 | 2009-05-28 | |||
| JP2000133792A | 2000-05-12 | |||
| JP2008244251A | 2008-10-09 |
Attorney, Agent or Firm:
YANAGIDA, Masashi et al. (JP)
Seiji Yanagida (JP)
Seiji Yanagida (JP)
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