Title:
ORGANOSILICON NANOMETER HYDROPHOBIC FILM LAYER AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2024/078227
Kind Code:
A1
Abstract:
Provided in the specific embodiments of the present invention are an organosilicon nanometer hydrophobic film layer and a preparation method therefor. The organosilicon nanometer hydrophobic film layer is formed by the plasma polymerization deposition of a siloxane monomer. During the preparation, a gaseous siloxane monomer is introduced, and twin electrodes are turned on to realize discharging in a plasma reaction chamber, such that the siloxane monomer undergoes plasma chemical vapor deposition on the surface of a substrate to form an organosilicon nanometer hydrophobic film layer. By using the preparation method of the specific embodiments of the present invention, the problem of large differences in the thickness of a film layer at different locations on a surface of a substrate caused by the deposition of a siloxane monomer introduced into a plasma chamber can be effectively overcome, and the coating speed and the wear resistance of the film layer are thereby improved.
Inventors:
ZONG JIAN (CN)
Application Number:
PCT/CN2023/118161
Publication Date:
April 18, 2024
Filing Date:
September 12, 2023
Export Citation:
Assignee:
JIANGSU FAVORED NANOTECHNOLOGY CO LTD (CN)
International Classes:
C23C16/515; B05B5/053; B05D7/00; C23C16/50; C23C16/509; H01H1/46; H01J37/32; H01L21/205; H01L21/31; H01L31/20
Foreign References:
| US4851256A | 1989-07-25 | |||
| CN103782366A | 2014-05-07 | |||
| CN106622824A | 2017-05-10 | |||
| CN111570216A | 2020-08-25 | |||
| JPH05217915A | 1993-08-27 | |||
| JPH08260157A | 1996-10-08 | |||
| US6709715B1 | 2004-03-23 |
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW CO., LTD. (CN)
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