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Title:
PARTICLE BEAM IRRADIATION SYSTEM AND CONTROL METHOD FOR PARTICLE BEAM IRRADIATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2011/148486
Kind Code:
A1
Abstract:
Provided is a particle beam irradiation system wherein a higher-accuracy dose distribution is given. An irradiation control unit (13) is provided with an energy setting controller (14) for setting the energy of a charged particle beam, a beam scanning controller (16) for controlling a beam scanner (41), and a beam diameter controller (15) for controlling a beam diameter changer (40, 60). The irradiation control unit (13) performs control such that the beam diameter of the charged particle beam is set to a first beam diameter by the beam diameter controller (15), a predetermined region to be irradiated is irradiated with the charged particle beam by scanning the charged particle beam in a stepwise form by the beam scanning controller (16), the beam diameter of the charged particle beam is set to a second beam diameter different from the first beam diameter by the beam diameter controller (15), and a region overlapping with at least part of the predetermined region to be irradiated is irradiated with the charged particle beam by scanning the charged particle beam in a stepwise form by the beam scanning controller (16).

Inventors:
HARADA HISASHI (JP)
Application Number:
PCT/JP2010/058979
Publication Date:
December 01, 2011
Filing Date:
May 27, 2010
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
HARADA HISASHI (JP)
International Classes:
A61N5/10; G21K1/02; G21K1/093
Domestic Patent References:
WO2006082651A12006-08-10
WO2006008265A12006-01-26
Foreign References:
JP2006346120A2006-12-28
JP2001212253A2001-08-07
Other References:
See also references of EP 2579265A4
Attorney, Agent or Firm:
OIWA Masuo et al. (JP)
Masuo Oiwa (JP)
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Claims: