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Title:
PHOTO-BASE GENERATOR
Document Type and Number:
WIPO Patent Application WO/2010/064632
Kind Code:
A1
Abstract:
Novel compounds which readily generate a base upon irradiation with long-wavelength light (actinic energy rays), a photo-base generator comprising any of these compounds, and a method of generating a base.  The compounds are represented by general formula [I]. (In formula [I], R1 and R2 each independently represents hydrogen or a liner, branched, or cyclic C1-10 alkyl group, or R1 and R2 form an optionally substituted C3-8 nitrogenous aliphatic ring or nitrogenous aromatic ring in cooperation with the nitrogen atom bonded thereto; R3 and R4 each independently represents hydrogen, a linear, branched, or cyclic C1-10 alkyl group, or optionally substituted phenyl; and R5, R6, R7, and R8 each independently represents hydrogen or a linear, branched, or cyclic C1-10 alkyl group.)

Inventors:
SAKAI NOBUHIKO (JP)
KURAMOTO AYAKO (JP)
URANO YOJI (JP)
Application Number:
PCT/JP2009/070180
Publication Date:
June 10, 2010
Filing Date:
December 01, 2009
Export Citation:
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Assignee:
WAKO PURE CHEM IND LTD (JP)
SAKAI NOBUHIKO (JP)
KURAMOTO AYAKO (JP)
URANO YOJI (JP)
International Classes:
C07D335/16; C07D409/12; C09K3/00
Domestic Patent References:
WO2004089529A12004-10-21
WO2008072651A12008-06-19
Foreign References:
JP2007262276A2007-10-11
JPS56125383A1981-10-01
JPS55154970A1980-12-02
JPS58120605A1983-07-18
JPH11269138A1999-10-05
JP2000330270A2000-11-30
JP2007241205A2007-09-20
JP2008247747A2008-10-16
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