Title:
PHOTOPOLYMERIZATION METHOD OF BLOCK COPOLYMER OF MAIN CHAIN TYPE "SEMI-FLUORO" ALTERNATING COPOLYMER
Document Type and Number:
WIPO Patent Application WO/2020/258355
Kind Code:
A1
Abstract:
The present invention relates to a photopolymerization method of a block copolymer of a main chain type "semi-fluoro" alternating copolymer, comprising the following steps: in a protective atmosphere, putting a methacrylate monomer and a "semi-fluoro" alternating copolymer (AB)n macroinitiator under the action of a photocatalyst to undergo a light-controlled active free radical polymerization in an organic solvent at 20-30°C, and carrying out the polymerization reaction under light conditions of 390 nm-590 nm for at least half an hour to obtain a block copolymer of a main chain type polyolefin, polyester or polyether "semi-fluoro" alternating copolymer. The polymerization method is carried out under visible light irradiation conditions, the polymerization process has "active" free radical polymerization characteristics, and the prepared polymer has a narrow molecular weight distribution.
Inventors:
CHENG ZHENPING (CN)
CHENG JIANNAN (CN)
ZHANG LIFEN (CN)
TU KAI (CN)
WANG JINYING (CN)
ZHU XIULIN (CN)
CHENG JIANNAN (CN)
ZHANG LIFEN (CN)
TU KAI (CN)
WANG JINYING (CN)
ZHU XIULIN (CN)
Application Number:
PCT/CN2019/094540
Publication Date:
December 30, 2020
Filing Date:
July 03, 2019
Export Citation:
Assignee:
UNIV SOOCHOW (CN)
International Classes:
C08F293/00; C08F2/46
Domestic Patent References:
| WO2008071957A1 | 2008-06-19 |
Foreign References:
| CN107619466A | 2018-01-23 | |||
| CN109384869A | 2019-02-26 | |||
| CN1911978A | 2007-02-14 | |||
| CN106674394A | 2017-05-17 | |||
| JP2016145304A | 2016-08-12 | |||
| CN105980416A | 2016-09-28 |
Attorney, Agent or Firm:
CENTRAL SOUTH WELL INTELLECTUAL PROPERTY OFFICE (CN)
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