Title:
PHOTOSENSITIVE RESIN COMPOSITION, PRINTING PLATE PRECURSOR AND FLEXOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2011/118052
Kind Code:
A1
Abstract:
Disclosed is a photosensitive resin composition that is superior in water developability, drying characteristics, and image reproducibility. The photosensitive resin composition comprises a water dispersible latex (A), a rubber (B), a surfactant (C), a photopolymerizable monomer (D), and a photoinitiator (E). The mass percent of the aforementioned (C) component is within the range of 0.1-20% of the combined mass of the aforementioned (A) component, the aforementioned (B) component, and the aforementioned (C) component. The mass percent of the aforementioned (A) component is within the range of 20-90% of the combined mass of the aforementioned (A) component and the aforementioned (B) component. The size in the dispersal phase, in which the aforementioned (B) component is the principal component, is less or equal to 10μm.
Inventors:
INOUE DAISUKE (JP)
MATSUOKA KOKI (JP)
MATSUOKA KOKI (JP)
Application Number:
PCT/JP2010/059173
Publication Date:
September 29, 2011
Filing Date:
May 31, 2010
Export Citation:
Assignee:
TOKAI RUBBER IND LTD (JP)
INOUE DAISUKE (JP)
MATSUOKA KOKI (JP)
INOUE DAISUKE (JP)
MATSUOKA KOKI (JP)
International Classes:
G03F7/00; B41N1/12; G03F7/004
Foreign References:
| JP2005010252A | 2005-01-13 | |||
| JP2001183813A | 2001-07-06 | |||
| JP2004295120A | 2004-10-21 | |||
| JP4211141B2 | 2009-01-21 | |||
| JP2005331811A | 2005-12-02 |
Other References:
"Naphthalenesulfonic acid salt (Na, K, Li, Ca) formaldehyde polycondensation", 14906 NO KAGAKU SHOHIN, THE CHEMICAL DAILY CO., LTD., 24 January 2006 (2006-01-24), pages 1398 - 1399, XP008167348
Attorney, Agent or Firm:
UENO, NOBORU (JP)
Ueno 登 (JP)
Ueno 登 (JP)
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