Title:
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/210583
Kind Code:
A1
Abstract:
The present invention, by using a slit member in which slits are formed in a configuration in which an antenna is arranged on the outside of a vacuum container, shortens the distance from the antenna to the inside of the vacuum container, and thereby makes it possible to efficiently supply, to the inside of the vacuum container, a high-frequency magnetic field generated from the antenna, and also prevent conduction within the slits of the slit member. A plasma source 200 for making a high-frequency current IR flow through an antenna 2 provided on the outside of a vacuum container 1 and generating plasma P in the vacuum container 1 is equipped with: a slit member 7 which blocks an opening formed at a position facing the antenna 2 of the vacuum container 1 and in which a plurality of slits 7x are formed along the longitudinal direction of the antenna 2; and a dielectric plate 8 for blocking the slits 7x from the outer side of the vacuum container 1. A recess 72 is formed in the slit member 7 by inwardly recessing an area that is on an outward surface 71 facing the outer side and that is sandwiched between adjacent slits 7x.
Inventors:
ANDO YASUNORI (JP)
Application Number:
PCT/JP2021/015341
Publication Date:
October 21, 2021
Filing Date:
April 13, 2021
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/505; H01L21/3065; H01L21/31
Foreign References:
| JP2001254188A | 2001-09-18 | |||
| US20140097752A1 | 2014-04-10 | |||
| JP2013129897A | 2013-07-04 | |||
| JP2020004534A | 2020-01-09 | |||
| JP2016143616A | 2016-08-08 |
Download PDF:
Previous Patent: ORGANIC ELECTROLUMINESCENT ELEMENT AND ELECTRONIC DEVICE
Next Patent: AIR TREATMENT DEVICE
Next Patent: AIR TREATMENT DEVICE