Title:
PLASMA TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/221829
Kind Code:
A1
Abstract:
[Problem] To provide a plasma treatment apparatus designed to shorten the return current path and ensure symmetry. [Solution] The plasma treatment apparatus according to an embodiment of the present invention is provided with a main chamber body, a stage, a high frequency electrode, multiple grounding members and a movable unit. The main chamber body has side walls, a portion of which includes an opening through which a substrate can pass. The multiple grounding members are disposed around the stage and electrically connect a side wall to the stage. The movable unit has a support for supporting a first grounding member, which is a portion of the multiple grounding members. The movable unit is configured so as to be capable of moving the support between a first position in which the first grounding member faces the inner circumferential surface of the opening with the opening therebetween and a second position in which the first grounding member is electrically connected to the inner circumferential surface.
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Inventors:
NAKAMURA FUMIO (JP)
TAMARU YOSHIHISA (JP)
YAJIMA TAKAHIRO (JP)
KATO YUKO (JP)
JINBO YOSUKE (JP)
UE YOSHINOBU (JP)
OKANO SHUICHI (JP)
OKAYAMA SATOHIRO (JP)
TAMARU YOSHIHISA (JP)
YAJIMA TAKAHIRO (JP)
KATO YUKO (JP)
JINBO YOSUKE (JP)
UE YOSHINOBU (JP)
OKANO SHUICHI (JP)
OKAYAMA SATOHIRO (JP)
Application Number:
PCT/JP2017/022313
Publication Date:
December 28, 2017
Filing Date:
June 16, 2017
Export Citation:
Assignee:
ULVAC INC (JP)
International Classes:
C23C16/505; H01L21/3065; H01L21/31; H05H1/46
Domestic Patent References:
| WO2010079756A1 | 2010-07-15 |
Foreign References:
| JP2012028682A | 2012-02-09 | |||
| JP2012517076A | 2012-07-26 | |||
| JP2012505313A | 2012-03-01 | |||
| US20130102133A1 | 2013-04-25 |
Attorney, Agent or Firm:
OMORI, Junichi (JP)
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