Title:
A PROBE ASSEMBLY FOR DETECTING AN ION IN A PLASMA GENERATED IN AN ION SOURCE
Document Type and Number:
WIPO Patent Application WO2002037525
Kind Code:
A3
Abstract:
A method and apparatus relating to an ion implantation system (10) that employs an ion source (12) for generating a plasma having an ion, and a probe assembly (30) for detecting the ion of the plasma is provided. The probe assembly (30) includes a probe body (36) and a focusing device (60) for extracting the ion from the plasma, and a filter (40) for filtering ions extracted from the plasma.
Inventors:
BENVENISTE VICTOR MAURICE
Application Number:
PCT/GB2001/004724
Publication Date:
September 06, 2002
Filing Date:
October 24, 2001
Export Citation:
Assignee:
AXCELIS TECH INC (US)
EATON LTD (GB)
EATON LTD (GB)
International Classes:
H01J27/02; H01J37/08; H01J37/32; (IPC1-7): H01J37/08; H01J27/02; H01J37/244; H05H1/00
Foreign References:
| US5650618A | 1997-07-22 | |||
| EP0614210A1 | 1994-09-07 | |||
| EP0975006A2 | 2000-01-26 |
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