Title:
PROCESS AND DEVICE FOR REMOVING VOLATILE SUBSTANCE FROM HIGHLY VISCOUS MATERIAL
Document Type and Number:
WIPO Patent Application WO/1981/000814
Kind Code:
A1
Abstract:
Process and device for removing a volatile substance such as a solvent or monomer from a highly viscous substance such as synthetic resin or the like using a thin film evaporator. In a case where a polymer containing a volatile substance such as a solvent, an unreacted monomer or the like in high concentration is supplied to a thin film evaporator to degas and remove the volatile substance, heating the monomer before supplying it to the evaporator causes the monomer reaction to proceed at a high temperature to produce a polymer having a low molecular weight polymer. The result is a deterioration in the quality of the monomer. When the polymer is supplied to the evaporator at a low temperature, the solvent and the monomer evaporate to increase the viscosity of the polymer. Thus, there is a possibility that the polymer will undergo partial solidification due to a temperature drop attributed to the latent heat of evaporation. It is difficult, therefore, to smoothly treat the polymer by the evaporator. This process supplies a low temperature polymer to the thin film evaporator and simultaneously effecting heating of the polymer and evaporation of the volatile substance by frictional heat in a gap formed between heating blades (19) provided at the end of agitating blades (3) and the inner wall of the evaporator. Thus, the process inhibits the reaction of the monomer and simultaneously prevents the monomer from decreasing in temperature, thereby providing a polymer of high quality.
More Like This:
| JP5184960 | Centrifugal thin film dryer and its cleaning method |
| WO/1990/009220 | FALLING FILM CONDENSER |
Inventors:
FUJII YUJI (JP)
ODA CHIKAO (JP)
ODA CHIKAO (JP)
Application Number:
PCT/JP1980/000181
Publication Date:
April 02, 1981
Filing Date:
August 12, 1980
Export Citation:
Assignee:
HITACHI LTD (JP)
FUJII YUJI (JP)
ODA CHIKAO (JP)
FUJII YUJI (JP)
ODA CHIKAO (JP)
International Classes:
B01D1/22; C08F6/00; C08F6/10; (IPC1-7): B01D1/22; C08F6/10
Foreign References:
| JPS5543121A | 1980-03-26 | |||
| US3067812A | 1962-12-11 | |||
| US3348600A | 1967-10-24 | |||
| US4093479A | 1978-06-06 |
Download PDF:
Previous Patent: SUPPRESSIVE AND ENHANCING ACTIVITIES OF IGE ANTIBODY PRODUCTION
Next Patent: APPARATUS OF A ROTARY PULSATIVE TYPE
Next Patent: APPARATUS OF A ROTARY PULSATIVE TYPE