Title:
PROCESS FOR PRODUCTION OF ALUMINUM-CONTAINING III NITRIDE SINGLE CRYSTAL
Document Type and Number:
WIPO Patent Application WO/2012/081670
Kind Code:
A1
Abstract:
A process for producing an aluminum-containing III nitride single crystal, comprising: a reaction step of bringing a halogen gas and aluminum into contact with each other at a temperature of 300 to 700˚C inclusive, thereby producing a mixed gas comprising a gas of an aluminum trihalide and a gas of an aluminum monohalide; a conversion step of setting the temperature of the mixed gas at a temperature that is equal to or higher than a temperature at which a solid of the aluminum trihalide is precipitated and that is lower by 50˚C or more than a temperature at which the halogen gas and aluminum have been reacted with each other in the reaction step, thereby converting the aluminum monohalide in the mixed gas into a solid substance; a separation step of separating the solid substance from the gas, thereby removing the gas of the aluminum trihalide; and a crystal growth step of using the gas of the aluminum trihalide as an aluminum nitride single crystal raw material without lowering the temperature and while keeping the temperature at a temperature that is equal to or higher than the temperature employed in the conversion step.
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Inventors:
NAGASHIMA TORU (JP)
HIRONAKA KEIICHIRO (JP)
HIRONAKA KEIICHIRO (JP)
Application Number:
PCT/JP2011/079060
Publication Date:
June 21, 2012
Filing Date:
December 15, 2011
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
NAGASHIMA TORU (JP)
HIRONAKA KEIICHIRO (JP)
NAGASHIMA TORU (JP)
HIRONAKA KEIICHIRO (JP)
International Classes:
C01F7/56; C30B29/38; C01F7/58; C01F7/62; C30B25/14; H01L21/205
Foreign References:
JP2003303774A | 2003-10-24 | |||
US20080083970A1 | 2008-04-10 | |||
JPS4942599B1 | 1974-11-15 | |||
JP2003303774A | 2003-10-24 | |||
JP2007042854A | 2007-02-15 |
Other References:
See also references of EP 2607527A4
Attorney, Agent or Firm:
MAEDA, Hitoshi et al. (JP)
Hitoshi Maeda (JP)
Hitoshi Maeda (JP)
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Claims:
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