Title:
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/158881
Kind Code:
A1
Abstract:
A radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically-active compound (B), and a solvent (C). The solid component content in the radiation-sensitive composition is 1%-80% by mass, the solvent content is 20%-99% by mass, and the resist base material (A) is a compound indicated by formula (1).
Inventors:
ECHIGO MASATOSHI (JP)
TOIDA TAKUMI (JP)
SATO TAKASHI (JP)
TOIDA TAKUMI (JP)
SATO TAKASHI (JP)
Application Number:
PCT/JP2016/059980
Publication Date:
October 06, 2016
Filing Date:
March 28, 2016
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/022
Domestic Patent References:
| WO2013024777A1 | 2013-02-21 |
Foreign References:
| JPH10310545A | 1998-11-24 | |||
| JP2005114829A | 2005-04-28 | |||
| JPH05113662A | 1993-05-07 | |||
| JPH05113663A | 1993-05-07 | |||
| JPH05346664A | 1993-12-27 | |||
| KR20140057959A | 2014-05-14 | |||
| KR20140057961A | 2014-05-14 | |||
| JPH06282067A | 1994-10-07 | |||
| JP2006053401A | 2006-02-23 | |||
| JP2006058427A | 2006-03-02 |
Other References:
See also references of EP 3279731A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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