Title:
RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING
Document Type and Number:
WIPO Patent Application WO2003102692
Kind Code:
A8
Abstract:
A radiation-sensitive patterning composition comprising: (1) at least one acid generating compound selected from compounds of formula (I) and formula (II) wherein: R1, R2, R3, R4, R5, and R6, are independently selected from the group consisting of hydrogen, nitro, hydroxyl, carbonyl, halogen, cyano, unsubstituted and substituted alkyl groups, unsubstituted and substituted cycloalkyl groups; unsubstituted and substituted alkoxy groups, and unsubstituted and substituted aryl groups; wherein: X<+> is an onium ion selected from the group consisting of diazonium, iodonium, sulfonium, phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium and arsenium; and n is an integer from 4 to 100; (2) at least one cross-linking agent cross-linkable by an acid; (3) at least one polymer compound capable of reacting with the cross-linking agent; and (4) at least one infrared absorbing compound.
Inventors:
TAO TING
Application Number:
PCT/US2003/017063
Publication Date:
January 20, 2005
Filing Date:
May 29, 2003
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS LLC (US)
International Classes:
B41C1/10; C08F12/30; C08G8/28; G03F7/00; G03F7/004; G03F7/038; (IPC1-7): G03F7/004; B41C1/10; G03F7/038
Download PDF:
Previous Patent: PATTERNING METHOD
Next Patent: HIGH REFLECTIVE INDEX PHOTOACTIVE COMPOUND FOR OPTICAL APPLICATIONS
Next Patent: HIGH REFLECTIVE INDEX PHOTOACTIVE COMPOUND FOR OPTICAL APPLICATIONS