Title:
RADIATION-SENSITIVE RESIN COMPOSITION, AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2015/033901
Kind Code:
A1
Abstract:
Provided is a radiation-sensitive resin composition including: an alicyclic olefin polymer (A) having acidic groups; a sulfonium salt-based photoacid generator (B) represented by general formula (1) (in general formula (1): R1, R2, and R3 each independently represent a C6-30 aryl group, a C4-30 heterocyclic group, a C1-30 alkyl group, a C2-30 alkenyl group, or a C2-30 alkynyl group, and may each have a substituent; and a is an integer in the range of 1-5); and a crosslinking agent (C).
Inventors:
ABE SATOSHI (JP)
Application Number:
PCT/JP2014/072984
Publication Date:
March 12, 2015
Filing Date:
September 02, 2014
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
G03F7/004; G03F7/038
Domestic Patent References:
| WO2008026401A1 | 2008-03-06 | |||
| WO2008117619A1 | 2008-10-02 | |||
| WO2010050357A1 | 2010-05-06 | |||
| WO2010067665A1 | 2010-06-17 | |||
| WO2012081507A1 | 2012-06-21 | |||
| WO2005116038A1 | 2005-12-08 |
Foreign References:
| JP2014137424A | 2014-07-28 | |||
| JP2006265322A | 2006-10-05 | |||
| JP5240380B1 | 2013-07-17 | |||
| JP2010197996A | 2010-09-09 | |||
| JP2010256508A | 2010-11-11 |
Attorney, Agent or Firm:
TOKOSHIE PATENT FIRM (JP)
It can exceed and is a patent business corporation. (JP)
It can exceed and is a patent business corporation. (JP)
Download PDF: