RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS INCLUDING RF POWER FILTERS

WIPO Patent Application WO/2012/018670

A3

A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.

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LONG MAOLIN (US)
LU RALPH (US)
EGLEY FRED (US)
ANDERSON THOMAS (US)
JAFARIAN-TEHRANI SEYED JAFAR (US)
GIARRATANO MICHAEL (US)

PCT/US2011/045722

April 19, 2012

July 28, 2011

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LAM RES CORP (US)
LONG MAOLIN (US)
LU RALPH (US)
EGLEY FRED (US)
ANDERSON THOMAS (US)
JAFARIAN-TEHRANI SEYED JAFAR (US)
GIARRATANO MICHAEL (US)

H01P1/20; H01P1/203

US20070284344A1	2007-12-13
US20030107459A1	2003-06-12
US20060125579A1	2006-06-15

NGUYEN, Joseph A. (San Jose, California, US)

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