Title:
REMOVAL OF MOISTURE FROM HYDRAZINE
Document Type and Number:
WIPO Patent Application WO/2018/089487
Kind Code:
A8
Abstract:
The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).
Inventors:
SHIMIZU HIDEHARU (US)
RAYNOR MARK (US)
TEMPEL DANIEL (US)
GARDINER ROBIN (US)
ALVAREZ JR (US)
RAYNOR MARK (US)
TEMPEL DANIEL (US)
GARDINER ROBIN (US)
ALVAREZ JR (US)
Application Number:
PCT/US2017/060629
Publication Date:
May 31, 2019
Filing Date:
November 08, 2017
Export Citation:
Assignee:
MATHESON TRI GAS INC (US)
International Classes:
B01D53/02; B01D53/26
Attorney, Agent or Firm:
PETERSEN, Steven, C. (US)
Download PDF:
Previous Patent: SYSTEMS AND METHODS FOR PROCESSING OBJECTS
Next Patent: KNIFE ASSEMBLY FOR SLICING MACHINES AND MACHINES EQUIPPED THEREWITH
Next Patent: KNIFE ASSEMBLY FOR SLICING MACHINES AND MACHINES EQUIPPED THEREWITH