RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

WIPO Patent Application WO/2022/130900

Kind Code:

A1

Abstract:

This resist composition comprises: a base material component (A); an acid generating agent component (B); and a photodegradable base (D0) including a compound (D01) represented by general formula (d0-1) and a compound (D02) represented by general formula (d0-2). In the formulae, Rd01 represents a chain-like or cyclic aliphatic hydrocarbon group optionally having a substituent, n01 represents an integer of 1-10, Rd02 represents a cyclic aliphatic hydrocarbon group having an oxygen atom (=O), m represents an integer of 1 or more, and Mm+ represents an organic cation having a valency of m.

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Inventors:

TAKAKI DAICHI (JP)
NAKAMURA TSUYOSHI (JP)
ITAGAKI YUSUKE (JP)

Application Number:

PCT/JP2021/042626

Publication Date:

June 23, 2022

Filing Date:

November 19, 2021

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)

International Classes:

G03F7/004; G03F7/039; G03F7/20

Domestic Patent References:

WO2017065207A1

2017-04-20

Foreign References:

JP2012137518A	2012-07-19
JP2015227326A	2015-12-17
JP2014235248A	2014-12-15
JP2010271686A	2010-12-02