Title:
SHOWER HEAD AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/085128
Kind Code:
A1
Abstract:
Inside a head body part, a diffusion chamber for diffusing gas used for substrate treatment is formed, and a plurality of jetting holes communicating with the diffusion chamber are provided in a facing surface facing a substrate. A heat insulating part is disposed on the side opposite to the facing surface side of the diffusion chamber, a hollow part connected to a supply and exhaust mechanism is formed therein, and a temperature regulation mechanism is provided on the facing surface side of the hollow part.
Inventors:
IIZUKA HACHISHIRO (JP)
Application Number:
PCT/JP2019/040299
Publication Date:
April 30, 2020
Filing Date:
October 11, 2019
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/31; C23C16/455
Foreign References:
| JP2000313961A | 2000-11-14 | |||
| JP2014220231A | 2014-11-20 | |||
| JP2000252270A | 2000-09-14 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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