Title:
SILANYL PHENOLS AND NAPHTHOLS
Document Type and Number:
WIPO Patent Application WO2002058016
Kind Code:
A3
Abstract:
There are described silanyl phenols and naphthols of formula (1a) or (1b), wherein R1 is hydrogen; halogen; hydroxy; C1-C20alkyl; C3-C12cycloalkyl; C1-C20alkoxy; trifluoromethyl; pentafluoroethyl; mono- or di-C1-C5alkylamino; hydroxy-C1-C5alkyl; or phenyl, phenyl-C1-C20alkyl, phenoxy, phenyl-C1-C20alkoxy, naphthyl or naphthyl-C1-C20alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, oxo, carboxy, carboxy-C1-C7alkyl ester, carboxy-C3-C12cycloalkyl ester, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro; R2, R3 and R4 are each independently of the others hydrogen; C1-C20alkyl; or C3-C12-cycloalkyl; R5, R6 and R7 are each independently of the others C1-C20alkyl, C5-C10aryl, C1-C20alkoxy, phenyl-C1-C20alkyl, phenyl-C1-C20alkoxy, C2-C5alkenyl, -O-Si-(C1-C5alkyl)3; or O-Si-(C1-C5alkyl)2-O-Si(C1-C5alkyl)3 and n is 0 or 1. The compounds exhibit a pronounced activity against Gram positive and Gram negative bacteria, and also against yeasts and moulds.
Inventors:
HOELZL WERNER (FR)
HAAP WOLFGANG (DE)
KOPPOLD JUERGEN (DE)
HAAP WOLFGANG (DE)
KOPPOLD JUERGEN (DE)
Application Number:
PCT/EP2002/000192
Publication Date:
December 19, 2002
Filing Date:
January 10, 2002
Export Citation:
Assignee:
CIBA SC HOLDING AG (CH)
HOELZL WERNER (FR)
HAAP WOLFGANG (DE)
KOPPOLD JUERGEN (DE)
HOELZL WERNER (FR)
HAAP WOLFGANG (DE)
KOPPOLD JUERGEN (DE)
International Classes:
A61L12/14; C07C39/19; C07C39/225; C07F7/08; C07F7/18; (IPC1-7): C07F7/08; C07F7/18; C07C39/19; C07C39/225; A61L12/14; D21H25/18
Domestic Patent References:
| WO1992003288A1 | 1992-03-05 |
Foreign References:
| EP0796861A1 | 1997-09-24 | |||
| EP0412407A2 | 1991-02-13 | |||
| DE3810247A1 | 1988-10-06 | |||
| US3705075A | 1972-12-05 | |||
| EP0385732A1 | 1990-09-05 | |||
| EP0846683A1 | 1998-06-10 | |||
| DE1812951A1 | 1969-07-03 |
Other References:
CHEMICAL ABSTRACTS, vol. 124, no. 2, 8 January 1996, Columbus, Ohio, US; abstract no. 10139, ONO, ICHIRO ET AL: "Preparation of hydrolysis-resistant phenolic group-containing siloxanes" XP002171049
CHEMICAL ABSTRACTS, vol. 117, no. 20, 16 November 1992, Columbus, Ohio, US; abstract no. 201937, KOBAYASHI, YOSHIHITO ET AL: "photosensitive composition for high resolution lithography" XP002171050
BRUCE, J. MALCOLM ET AL: "Claisen rearrangement of meta-substituted allyl phenyl ethers", J. CHEM. SOC., PERKIN TRANS. 1 (1981), (10), 2677-9, 1981, XP002198137
CHEMICAL ABSTRACTS, vol. 117, no. 20, 16 November 1992, Columbus, Ohio, US; abstract no. 201937, KOBAYASHI, YOSHIHITO ET AL: "photosensitive composition for high resolution lithography" XP002171050
BRUCE, J. MALCOLM ET AL: "Claisen rearrangement of meta-substituted allyl phenyl ethers", J. CHEM. SOC., PERKIN TRANS. 1 (1981), (10), 2677-9, 1981, XP002198137
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