Title:
SINTERED COMPLEX OXIDE, METHOD FOR PRODUCING SINTERED COMPLEX OXIDE, SPUTTERING TARGET AND METHOD FOR PRODUCING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2010/007989
Kind Code:
A1
Abstract:
A sintered complex oxide containing metal oxide particles (a) having a hexagonal lamellar structure and containing zinc oxide and indium, and metal oxide particles (b) having a spinel structure and containing a metal element M (provided that M represents aluminum and/or gallium. The metal oxide particles (a) have a mean particle length of not more than 10 μm, and not less than 20% of the metal oxide particles (a) on a number basis have an aspect ratio (length/breadth) of not less than 2.
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Inventors:
KURAMOCHI HIDETO (JP)
OMI KENJI (JP)
ICHIDA MASANORI (JP)
IIGUSA HITOSHI (JP)
OMI KENJI (JP)
ICHIDA MASANORI (JP)
IIGUSA HITOSHI (JP)
Application Number:
PCT/JP2009/062739
Publication Date:
January 21, 2010
Filing Date:
July 14, 2009
Export Citation:
Assignee:
TOSOH CORP (JP)
KURAMOCHI HIDETO (JP)
OMI KENJI (JP)
ICHIDA MASANORI (JP)
IIGUSA HITOSHI (JP)
KURAMOCHI HIDETO (JP)
OMI KENJI (JP)
ICHIDA MASANORI (JP)
IIGUSA HITOSHI (JP)
International Classes:
C04B35/453; C23C14/08; C23C14/34
Domestic Patent References:
| WO2008072486A1 | 2008-06-19 | |||
| WO2007034733A1 | 2007-03-29 |
Foreign References:
| JP2008063214A | 2008-03-21 | |||
| JP2805813B2 | 1998-09-30 | |||
| JPH062130A | 1994-01-11 | |||
| JPH0625838A | 1994-02-01 | |||
| JP2004175616A | 2004-06-24 | |||
| JP3864425B2 | 2006-12-27 | |||
| JP2006200016A | 2006-08-03 |
Other References:
See also references of EP 2301904A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)
Yoshiki Hasegawa (JP)
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