Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/204106
Kind Code:
A1
Abstract:
A substrate processing device (10) that processes a plurality of substrates that are arranged at prescribed intervals and that is characterized by having: a processing tank (12) that stores processing liquid and that has side surfaces (13) that run in the thickness direction of the plurality of substrates; and discharge parts (14) that are arranged at a bottom section of the processing tank (12) and that upwardly discharge processing liquid toward the side surfaces (13).
Inventors:
SHOMORI HIROFUMI (JP)
KIMURA ATSUO (JP)
KIMURA ATSUO (JP)
Application Number:
PCT/JP2016/067492
Publication Date:
December 22, 2016
Filing Date:
June 13, 2016
Export Citation:
Assignee:
J E T CO LTD (JP)
International Classes:
H01L21/306; H01L21/304
Foreign References:
| JP2009081257A | 2009-04-16 | |||
| JP2002134467A | 2002-05-10 | |||
| JP2009081240A | 2009-04-16 | |||
| US20090008364A1 | 2009-01-08 |
Attorney, Agent or Firm:
YOSHIDA TADANORI (JP)
Yoshida Justice (JP)
Yoshida Justice (JP)
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