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Title:
SUBSTRATE PROCESSING EQUIPMENT
Document Type and Number:
WIPO Patent Application WO/2006/057319
Kind Code:
A1
Abstract:
Substrate processing equipment is composed of a substrate transfer chamber (5) provided with a substrate transfer apparatus (11), and a plurality of processing chambers (6-9) communicated with the transfer chamber (5). Based on a processing time of a process that requires the longest time among processes performed in the processing chambers (6-9), time intervals for putting in the substrate are set.

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Inventors:
TAKANO SATOSHI (JP)
Application Number:
PCT/JP2005/021618
Publication Date:
June 01, 2006
Filing Date:
November 18, 2005
Export Citation:
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Assignee:
HITACHI INT ELECTRIC INC (JP)
TAKANO SATOSHI (JP)
International Classes:
H01L21/677; H01L21/02
Foreign References:
JPS62207866A1987-09-12
Attorney, Agent or Firm:
Moriyama, Tatsuo (7-10 Ebisu-nishi 2-chom, Shibuya-ku Tokyo 21, JP)
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