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Patent Searching and Data


Title:
SUPPLY-LIQUID PRODUCING APPARATUS AND SUPPLY-LIQUID PRODUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/122771
Kind Code:
A1
Abstract:
Provided is a supply-liquid producing apparatus that can produce a supply liquid in an amount needed at a point of use. A supply-liquid producing apparatus according to the present invention includes: a mixer 113 that mixes water and ozone gas to produce ozone water; a booster pump 112 that increases the pressure of the water to be supplied to the mixer 113; a gas-liquid separation tank 114 that separates the ozone water produced by the mixer 113 into ozone water to be supplied to a point of use 119 and exhaust gas to be discharged from an exhaust port 125; a flowmeter 117 that measures the flow rate of the ozone water to be supplied from the gas-liquid separation tank 114 to the point of use 119; a flow-rate control unit 126 that adjusts the pressure (flow rate) of water to be increased in pressure and supplied to the mixer 113 by controlling the booster pump 112 according to the flow rate of the ozone water measured by the flowmeter 117; and an exhaust pressure control unit 123 that controls the exhaust pressure of the exhaust gas so as to maintain the water level constant in the gas-liquid separation tank 114.

Inventors:
OZAWA SUGURU (JP)
NAKAGAWA YOICHI (JP)
TAKAHASHI MUNETO (JP)
XU TAO (JP)
YOKOYAMA TOSHIO (JP)
Application Number:
PCT/JP2017/000983
Publication Date:
July 20, 2017
Filing Date:
January 13, 2017
Export Citation:
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Assignee:
EBARA CORP (JP)
International Classes:
B01F15/02; B01F1/00; B01F3/04; B01F3/08
Foreign References:
JP2010214263A2010-09-30
JPH09906A1997-01-07
JP2014117628A2014-06-30
JP2015181976A2015-10-22
JP2003236353A2003-08-26
JP2012024719A2012-02-09
Other References:
See also references of EP 3403717A4
Attorney, Agent or Firm:
OHNO Seiji et al. (JP)
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