Title:
SYSTEM FOR RAPIDLY ANALYZING EQUIPMENT DIFFERENCE ROOT CAUSE IN SEMICONDUCTOR MANUFACTURING
Document Type and Number:
WIPO Patent Application WO/2023/226675
Kind Code:
A1
Abstract:
Provided in the present invention is a system for rapidly analyzing equipment difference root causes in semiconductor manufacturing. The system comprises: a production parameter acquisition module, a data association module, a database module, a data summarization and display module, a difference impact proportion sorting module and a key parameter item data display module. The production parameter acquisition module is used for acquiring production parameter items and parameter values thereof of products in the equipment. The data association module is used for associating product names, process names, equipment names, production parameter item names and parameter values. The database module is used for generating a corresponding database for the associated data. The data summarization and display module is used for summarizing the associated data selected from the database by the user by means of a PCA algorithm, and carrying out graphic display on summarized sample scores. The difference impact proportion sorting module sorts the production parameter items from high to low according to difference impact proportions. The key parameter item data display module displays data of key parameter items affecting the difference.
Inventors:
SHI WEITANG (CN)
QIU LIDONG (CN)
WU WENHAO (CN)
QIU LIDONG (CN)
WU WENHAO (CN)
Application Number:
PCT/CN2023/091120
Publication Date:
November 30, 2023
Filing Date:
April 27, 2023
Export Citation:
Assignee:
SHANGHAI GLORYSOFT CO LTD (CN)
International Classes:
G06Q10/10; G06Q50/04
Foreign References:
| CN114912898A | 2022-08-16 | |||
| CN107679163A | 2018-02-09 | |||
| CN108257248A | 2018-07-06 | |||
| CN110276410A | 2019-09-24 | |||
| CN114444986A | 2022-05-06 |
Attorney, Agent or Firm:
SHANGHAI CPTO INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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