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Title:
UNDERLAYER-FILM-FORMING COMPOSITION FOR IMPRINTING, AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/157226
Kind Code:
A1
Abstract:
The present invention provides an underlayer-film-forming composition for imprinting, capable of forming an underlayer film having excellent surface flatness and adhesiveness. The underlayer-film-forming composition for imprinting is characterized in containing: (A) a resin having a weight-average molecular weight of 1000 or greater, the resin having unsaturated ethylene groups (P) and cyclic ether groups (T) selected from oxiranyl groups and oxetanyl groups; and (B) a solvent.

Inventors:
KITAGAWA HIROTAKA (JP)
ENOMOTO YUICHIRO (JP)
Application Number:
PCT/JP2014/058324
Publication Date:
October 02, 2014
Filing Date:
March 25, 2014
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02; C08F8/00; C08G59/32
Domestic Patent References:
WO2011021573A12011-02-24
WO2011013630A12011-02-03
WO2007066597A12007-06-14
Foreign References:
JP2011508680A2011-03-17
JP2007323059A2007-12-13
JP2009503139A2009-01-29
JP2011231308A2011-11-17
JP2008105414A2008-05-08
JP2012094821A2012-05-17
JP2011206977A2011-10-20
Other References:
S. CHOU ET AL., APPL. PHYS. LETT., vol. 67, 1995, pages 3114
M. COLBUN ET AL., PROC. SPIE, vol. 3676, 1999, pages 379
S.CHOU ET AL., APPL.PHYS.LETT., vol. 67, 1995, pages 3114
M.COLBUN ET AL., PROC.SPIE, vol. 3676, 1999, pages 379
See also references of EP 2980831A4
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
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