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Patent Searching and Data


Title:
WHOLE FACE MASK FOR OVERALL RAPID DRESSING AND PRODUCING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2008/003201
Kind Code:
A1
Abstract:
A whole face mask for overall rapid dressing comprises a film layer (10) provided with eyelets (1), canthi partitioning slits (2) and nose partitioning slits (3). The film layer (10) comprises a printing paper layer, an ink pattern layer, an adhesive layer and a releasable film layer, and the pattern of the ink pattern layer is attached to the face by the releasable film layer. A method for producing the whole face mask for overall rapid dressing combines a printing technique with a face mask tailoring technique.

Inventors:
ZHU DINGLIANG (CN)
Application Number:
PCT/CN2007/000610
Publication Date:
January 10, 2008
Filing Date:
February 26, 2007
Export Citation:
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Assignee:
ZHU DINGLIANG (CN)
International Classes:
A45D44/00; A45D33/38; A45D40/00; A61K8/00
Domestic Patent References:
WO2002062312A12002-08-15
Foreign References:
CN2566684Y2003-08-20
CN1305791A2001-08-01
US6264786B12001-07-24
DE202004015685U12004-12-30
Attorney, Agent or Firm:
SHENZHEN ZHONGYI PATENT TRADEMARK OFFICE (No. 1014 Shennan Zhong RoadFutian, Shenzhen, Guangdong 7, CN)
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