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WO/2024/100964A1 |
Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, ...
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WO/2024/101044A1 |
Provided are a resist composition in which the temporal stability during storage is increased and a decrease in fine resolution after storage is reduced, a resist pattern formation method using said resist composition, and a compound use...
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WO/2024/090041A1 |
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when ne...
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WO/2024/079128A1 |
The invention relates to compounds and their therapeutic use, said compounds having the formula (I): wherein, for example,  Z is representing a (II)  X is representing a NR5R6 group wherein R5 and R6 are hydrogen,  R1 is represe...
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WO/2024/075535A1 |
In the present invention, there is employed a resist composition having, as a base resin, a polymer compound that has constituent units derived from a compound expressed by general formula (a0−m). In the formula, W is a polymerizable-g...
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WO/2024/070091A1 |
Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness ...
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WO/2024/071125A1 |
A resist composition comprises: a resin component (A1), the solubility of which in a developer solution is changed by the action of acid; and a compound (D0) represented by general formula (d0). In the formula: Ar is an aromatic ring; Xd...
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WO/2024/053718A1 |
The present invention employs a resist composition that contains a resin component having a constituent unit represented by general formula (a0-1). In formula (a0-1), R01 is a divalent linking group or a single bond. R02 is an acid-disso...
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WO/2024/043098A1 |
The present invention employs a resist composition containing: a base material component of which the solubility in a developing solution changes due to the action of an acid; and a compound represented by general formula (d0). In formul...
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WO/2024/043121A1 |
The present invention employs a resist composition including: a base material component, the solubility of said base material component in a developing fluid changing due to the action of an acid; and a compound represented by general fo...
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WO/2024/029354A1 |
Provided is a novel compound that has photosensitivity such that said compound rapidly decomposes and generates an acid when irradiated with light rays having a wavelength of 20 nm or lower.　A sulfonium salt according to the present in...
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WO/2024/024801A1 |
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-val...
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WO/2024/024703A1 |
The present invention relates to a resist composition that generates an acid by exposure to light, and that exhibits a change in solubility to a liquid developer through the action of the acid. The resist composition contains a base mate...
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WO/2024/024692A1 |
Provided are a resist film, a pattern formation method, an electronic device manufacturing method that includes the pattern formation method, and an active light-sensitive or radiation-sensitive resin composition satisfying the following...
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WO/2024/024844A1 |
The present invention provides: a method for producing an active ray-sensitive or radiation-sensitive resin composition, the method comprising a step (X) for mixing a specified onium salt compound (1) with a specified salt compound (2) i...
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WO/2024/014462A1 |
This resist composition comprises a resin component (A1) that exhibits change in solubility in a developing solution due to the action of an acid. The resin component (A1) has a constitution unit (a0) derived from a compound represented ...
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WO/2023/238890A1 |
Provided is a compound that is stably immobilized on the surface of a resin while having excellent compatibility to the resin, and that is suitable as an antistatic agent that can express high antistatic performance even with a small qua...
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WO/2023/228544A1 |
A compound according to one embodiment of the present disclosure is represented by formula (1).　In formula (1), R1 to R4 each independently is an optionally substituted hydrocarbon group.
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WO/2023/223865A1 |
Provided is a resist composition which generates an acid upon exposure to light and of which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) of which th...
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WO/2023/222909A1 |
The inventors have now succeeded in developing arylsulfonium salts, in particular triarylsulfonium salts and dibenzothiophenium salts and a new use of said arylsulfonium salts. These compounds have the advantage of having a thioaryl grou...
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WO/2023/218970A1 |
Provided are, inter alia, an active-ray-sensitive or radiation-sensitive resin composition containing a resin that increases in polarity under the action of acid and a compound having a specified structure, an active-ray-sensitive or rad...
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WO/2023/199907A1 |
The present invention employs a resist composition which generates an acid upon exposure to light and changes the solubility with respect to a developer solution by the action of the acid, and which contains a compound that is represente...
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WO/2023/200916A1 |
An acid medium is provided comprising one or more water-soluble oxidized disulfide oil ODSO compounds. The use of such an acid medium is disclosed as a replacement for conventional acids. Embodiments of the present disclosure are directe...
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WO/2023/189961A1 |
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...
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WO/2023/181856A1 |
Provided is a compound constituted from a heteropolyacid anion, a photoreactive cation represented by formula (1), and a hydrogen cation. Also provided is a photosensitive composition containing this compound. (In formula (1), R1 and R2 ...
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WO/2023/181060A1 |
The present invention describes synthesis of Toluidine blue O for a formulation to be used for screening and biopsy site identification in oral cancer. The invention discloses two formulations and a method of delivery of the said formula...
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WO/2023/176546A1 |
The present invention provides a resist composition which contains a base material component (A) and a compound (B0) that is represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents a...
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WO/2023/171670A1 |
This resist composition, which generates an acid by being exposed to light and of which the solubility in a developer changes due to the action of the acid, contains a resin component (A1) of which the solubility in a developer changes d...
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WO/2023/162836A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (P) which can be decomposed by the action of an acid to increase the polarity thereof and a compound (Q) represented by a...
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WO/2023/162907A1 |
This resist composition includes a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Ar0 is an arylene group or a hetero arylene group. Rm1 and Rm2 are substituents other than an iodine atom. L01...
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WO/2023/157635A1 |
The present invention provides an actinic-ray-sensitive or a radiation-sensitive resin composition having excellent roughness performance and roughness performance after the passage of time. This actinic-ray-sensitive or radiation-sensit...
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WO/2023/126377A1 |
The present invention provides a method for obtaining ionic compounds of formula (I) which comprises two-steps carried out in a one-pot manner. Said method includes the reaction of a N-(sulfinyl)sulfonamide of formula R1SO2N=S=O with a s...
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WO/2023/120250A1 |
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition, etc. that, when forming an ultra-fine pattern (for example, a line and space pattern of 25 nm or less, or a hole pattern with a hole diameter of 25 nm or less...
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WO/2023/119910A1 |
Provided is a radiation-sensitive composition containing: a polymer having an acid dissociable group; and at least one compound (b) selected from the group consisting of a compound represented by formula (1) and a compound represented by...
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WO/2023/102162A1 |
Described herein are novel compounds, compositions and methods for treatment of diseases including cancer using such compounds, compositions, and methods. The compounds include those of Formula (I):
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WO/2023/100574A1 |
Provided are: a radiation-sensitive resin composition that can be formed into a resist film having satisfactory levels of sensitivity and CDU performance even when a next-generation technology is applied; and a pattern formation method.ã...
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WO/2023/085367A1 |
Provided is a compound having a GCL inhibitory activity.　A compound represented by general formula (I) (all symbols in the formula are as defined in the description) or a salt thereof has GCL inhibitory activity, and therefore is usefu...
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WO/2023/063203A1 |
Provided is a resist composition which generates an acid upon exposure to light and for which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) for which ...
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WO/2023/053877A1 |
Provided are: a compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to actinic energy, e.g., EB or EUV, have excellent resolution in lithography, and can give fine patterns r...
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WO/2023/053977A1 |
The present invention provides a method for producing a salt (P) of an organic cation and an organic anion, the method comprising: (1) a step for obtaining a product which contains the salt (P) by subjecting a salt (I) of the organic cat...
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WO/2023/048168A1 |
The present invention provides a resist composition which contains a base material component (A) and a compound (D0) that is represented by general formula (d0). In the formula, Rd0 represents a fused ring group wherein an aromatic ring ...
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WO/2023/048128A1 |
This resist composition contains a base material component (A), and a compound (B0) represented by general formula (b0). In the formula, Rb0 is a fused ring group in which an aromatic ring and an alicyclic ring are fused. The alicyclic r...
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WO/2023/045910A1 |
The present application discloses a small-molecule compound having a naphthol ether structure, and a use thereof. Disclosed in the present application are a compound having a structure represented by general formula (I), a pharmaceutical...
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WO/2023/048244A1 |
The present invention provides a method for producing a tetrafluorosulfanyl group-containing aryl compound, wherein a tetrafluorosulfanyl group-containing aryl compound represented by general formula (1) is synthesized by carrying out a ...
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WO/2023/040736A1 |
A substituted sulfite compound, and a preparation method therefor and a use thereof. The substituted sulfite compound has a structure represented by formula (I), and has excellent acaricidal effect.
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WO/2023/030279A1 |
Provided are a 3, 3-difluoroallylic onium salt as represented by formula (C), and a preparation method of the substance. Cheap industrial raw materials are used to prepare the important fluorine-containing reagent, which can be used as a...
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WO/2023/007426A1 |
The present invention relates to a novel styrene compound of Formula (I) or a salt thereof Formula (I) wherein, the definition of Q, R2, and m are as described in the description. The present invention also relates to a process for the p...
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WO/2023/008345A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition which contains a compound (I) that produces an acid when irradiated with active light or radiation, while having an ionic structure and a ...
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WO/2023/006789A1 |
Compounds of formula I wherein the substituents are as defined in claim 1, and the agrochemically acceptable salts, stereoisomers, enantiomers, tautomers and N-oxides of those compounds, can be used as insecticides.
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WO/2023/008354A1 |
The present invention provides a resist composition which contains a resin (A) and a solvent (B) containing a compound (B1) represented by general formula (b-1), and which contains an active ingredient in an amount of 45 mass% or less wi...
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