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WO/2024/101393A1 |
The present invention provides a repelling agent including a polymer selected from polymers (I)-(III), which are defined as follows. (I) A polymer having a repeat unit (1) that is represented by the formula –[CH2C(–Q1)C(=O)R1]– (wh...
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WO/2024/102293A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) silica abrasive; (b) an amine-based compound, wherein the amine-based compound comprises a carbon to nitrogen ratio of about 1:1 to about 3:1; (c) optiona...
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WO/2024/101396A1 |
The present invention provides a novel repellent agent which contains a liquid repellent compound that has an amine skeleton and one or more long-chain hydrocarbon-containing groups represented by formula -X-Rn (wherein the definition of...
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WO/2024/101871A1 |
An inorganic particle according to the present invention has a shape in which a plurality of spherical protrusions are formed on the surface of a spherical primary particle, and is composed of a mixture of amorphous and crystalline phase...
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WO/2024/101404A1 |
This fluorine atom containing silane compound is represented by formula (1). The symbols have the same meaning as described in the description. (1): (Rf1)α 1-XA-(RSi)α 2
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WO/2024/100964A1 |
Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, ...
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WO/2024/101242A1 |
Provided is, according to one embodiment, a polishing liquid composition having excellent dispersion stability and capable of both improving polishing speed and reducing post-polishing scratches on the substrate surfaces. The present d...
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WO/2024/102266A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive particle; (b) an ionic oxidizer; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 1 to about 7, the abra...
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WO/2024/095883A1 |
A modifier for a thermoplastic resin that contains a rosin resin having a mass residual rate after heating for two hours at 300°C of 40 mass% or more and a mixed methylcyclohexane aniline cloud point (MMAP) of from -10 to 20°C.
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WO/2024/096005A1 |
An electrochromic sheet (100) according to the present invention comprises: a first support layer (1); an electrolyte layer (4) provided on the first support layer (1); a first electrochromic layer (3) provided on at least one surface of...
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WO/2024/095880A1 |
Disclosed is a modifying agent for thermoplastic resins, the modifying agent containing a hydrogenated aromatic hydrocarbon resin that has a residual mass ratio of 65% by mass or more after being heated at 300°C for two hours, while hav...
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WO/2024/097974A1 |
The subject application relates to bonded abrasive with low wetting bond material. An abrasive article including a bonded abrasive body having a particular MOR/EMOD ratio associated with a particular bond vol%. The body also can include ...
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WO/2024/092856A1 |
The present invention relates to the technical field of biomedical materials, and particularly, to a super-hydrophobic self-cleaning anticoagulant composite coating material, a method for preparing same, and use thereof. In the provided ...
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WO/2024/096277A1 |
The present invention relates to a polishing slurry composition. An embodiment pertains to a polishing slurry composition for organic membrane polishing, the composition including: polishing particles containing metal-coated metal oxide;...
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WO/2024/095868A1 |
The present invention provides a resist composition which generates an acid by being exposed to light, and the solubility of which in a developer solution is changed by the action of an acid. This resist composition contains: a resin com...
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WO/2024/095878A1 |
This modifier for a thermoplastic resin comprises a hydrogenated aromatic hydrocarbon resin having a mass residual rate of at least 64 mass% after heating at 300ºC for 2 hours, and a mixed methylcyclohexane-aniline cloud point (MMAP) of...
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WO/2024/095948A1 |
A sealing agent comprising: a cationically polymerizable compound (A); a cationic polymerization initiator (B); and a curing retarder (X), wherein a viscosity change ratio represented by V1/V0 is not less than 1.00 but less than 1.75, wh...
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WO/2024/095652A1 |
Disclosed is a non-fluorine water-repellent composition that is capable of improving water repellency during actual use of various articles. A non-fluorine water-repellent composition according to the present disclosure contains: (A) at ...
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WO/2024/094856A1 |
The present invention relates to the use of a coating system as a very durable anti-slip coating of surfaces, in particular floors.
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WO/2024/094534A1 |
The invention relates to an abrasive element for an abrasive (15), in particular a flexible abrasive (15), preferably an abrasive disc, for abrading a workpiece with a main abrasive element (13). According to the invention, the abrasive ...
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WO/2024/095801A1 |
The present invention provides an amorphous carbon-metal iron composite that is safe and easy to handle, that maintains activity for a long period of time, and that is capable of sufficiently reducing organic halogen compounds contained ...
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WO/2024/091104A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristic of the present invention with a...
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WO/2024/091103A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristics of the present invention with ...
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WO/2024/091100A1 |
Provided are cerium oxide particles for chemical mechanical polishing and a chemical mechanical polishing slurry composition comprising same. A combination of the characteristic cerium oxide particles of the present invention with a dish...
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WO/2024/089919A1 |
This method selects a raw material for obtaining abrasive grains, wherein the raw material includes cerium, and the raw material is selected on the basis of an average value of the positron lifetime measured by positron annihilation spec...
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WO/2024/090423A1 |
The purpose of the present invention is to provide: a composition which contains a novel compound that has excellent handling properties; and a production method, use or the like of this composition. The present invention provides a (met...
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WO/2024/089923A1 |
Provided is a selection method for a raw material for obtaining abrasive grains, wherein the raw material contains cerium, and the raw material is selected on the basis of a peak top temperature in a differential curve of a thermogravime...
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WO/2024/091102A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a slurry composition for chemical-mechanical polishing comprising same. By means of a combination of cerium oxide particles, the characteristic of the present inve...
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WO/2024/089920A1 |
This method is for selecting abrasive grains containing cerium, and involves selecting the abrasive grains on the basis of the average positron lifetime as measured by a positron annihilation method. Abrasive grains according to the pres...
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WO/2024/089921A1 |
Provided is a selection method for abrasive grains, wherein the abrasive grains contain cerium and the abrasive grains are selected on the basis of the crystallite diameter thereof. Also provided are abrasive grains containing cerium and...
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WO/2024/091105A1 |
Provided are: cerium oxide particles for chemical mechanical polishing; and a slurry composition for chemical mechanical polishing comprising same. Provided are: a slurry composition for chemical mechanical polishing that can significant...
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WO/2024/091101A1 |
Provided are: chemical mechanical polishing cerium oxide particles; and a chemical mechanical polishing slurry composition containing same. Provided are the chemical mechanical polishing slurry composition and a method for manufacturing ...
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WO/2024/090041A1 |
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when ne...
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WO/2024/091214A1 |
A deicing and snow melting device, for lowering the melting point of ice and snow, comprises of a plurality of pellets including an active ingredient. Each pellet of the plurality of pellets has at least an underside and a topside. The a...
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WO/2024/090372A1 |
Provided is a novel oilproofing agent that is capable of imparting oil resistance to a base material, the oilproofing agent containing a compound expressed by the formula: [in the formula, Y− is a counter anion, X is a direct bond or a...
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WO/2024/089922A1 |
Provided is a selection method for abrasive grains, wherein the abrasive grains contain cerium and are selected on the basis of a short-life component value of the positron lifetime measured by means of a positron annihilation method. Pr...
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WO/2024/091448A1 |
A liquid composition configured to form a transparent oleophobic and hydrophobic antimicrobial coating after application and post-cure of the liquid composition on a substrate. A transparent oleophobic and hydrophobic antimicrobial coati...
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WO/2024/090311A1 |
A light-absorbing composition according to the present invention contains: an ultraviolet ray-absorbing compound having a hydroxy group and a carbonyl group in a molecule; metal components; polyvinyl butyral; and isocyanate. At least som...
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WO/2024/091098A1 |
Provided are: cerium oxide particles for chemical mechanical polishing; and a chemical mechanical polishing slurry composition containing same. The characteristic cerium oxide particles of the present invention can be combined with a sur...
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WO/2024/091099A1 |
Provided are cerium oxide particles for chemical mechanical polishing and a chemical mechanical polishing slurry composition comprising same. A combination of the characteristic cerium oxide particles of the present invention with a cati...
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WO/2024/084957A1 |
Provided are: a polishing method which can maintain a sufficiently high insulating-film polishing rate and selectivity and can be sufficiently inhibited from causing polishing flaws; and a method for producing a semiconductor component u...
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WO/2024/085144A1 |
The present invention provides: an allergen inhibitor that exhibits an excellent allergen inhibiting effect; and an allergen inhibition product using the allergen inhibitor. This allergen inhibitor contains an allergen inhibiting compoun...
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WO/2024/085009A1 |
The method for producing an inorganic oxide nanofiber of one embodiment of the present disclosure dissolves water, a metal alkoxide, a catalyst, and a surfactant in a protic or aprotic polar solvent to prepare a mixed solution, removes t...
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WO/2024/085217A1 |
This polishing agent composition for a plastic lens contains alumina, a water-soluble polymer compound, and water, wherein the water-soluble polymer compound is an oxazoline group-containing water-soluble polymer compound in which an oxa...
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WO/2024/085218A1 |
This polishing agent composition for a plastic lens contains alumina, polyvinyl alcohol, and water, wherein the degree of saponification of the polyvinyl alcohol is 40-98 mol%, and the degree of polymerization of the polyvinyl alcohol is...
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WO/2024/085793A1 |
Disclosed is the use of an aqueous deicing/anti-icing composition for reducing carbon fibre degradation. Said composition comprises 40-60% by weight of at least one alkali metal carboxylate and 0.1-2.0% by weight of microfibrillated cell...
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WO/2024/080235A1 |
As illustrated by fig. 1, a supply liquid-containing liquid storage tube 100 according to the present invention has a liquid supply portion 10 and a liquid storage portion 20; in the liquid storage portion 20, a supply liquid 30 and a mu...
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WO/2024/080310A1 |
The present disclosure provides a water repellent oil repellent agent which contains a polysaccharide and a sizing agent, wherein a 20% by mass aqueous solution of the polysaccharide has a viscosity of 60 cps or less at 50°C.
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WO/2024/080833A1 |
The present invention provides a slurry composition for chemical mechanical polishing and a manufacturing method therefor, wherein the slurry composition is capable of achieving a high polishing rate for low dielectric constant films rel...
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WO/2024/080076A1 |
The water-repelling/dust-repelling agent according to the present invention comprises: an ionic wax-based emulsion containing a wax component, which is a water-repelling component, and being obtained by emulsifying the wax component usin...
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