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WO/2024/099852A1 |
Cleaning contamination particles from a clamp of a lithography apparatus is described. Used clamps have burl tops contaminated with contamination particles which need to be cleaned before returning to service. Currently, to fully clean t...
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WO/2024/099673A1 |
A lithographic patterning device contamination control assembly comprising a support structure configured to support a patterning device floating with respect to ground, a masking apparatus configured to selectively mask the lithographic...
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WO/2024/101295A1 |
A production method for a cured product according to the present invention includes a pressure reduction step for putting a resin layer under a pressure of less than 101,325 Pa and a heating step for heating the resin layer under said pr...
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WO/2024/101182A1 |
The present invention is a photosensitive resin composition, characterized by including a polymer obtained by copolymerizing: (A) a silicone resin having a glycidyl group, (B) a photo-cationic polymerization initiator, and (C) quantum do...
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WO/2024/101358A1 |
The present disclosure pertains to a photosensitive resin composition which contains: a base resin containing a maleimide compound; a crosslinking agent; and a photopolymerization initiator. The maleimide compound is the reaction product...
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WO/2024/099740A1 |
Systems and methods of measuring a focus position in a metrology system include introducing an optical element into a measurement arm of the metrology system, the optical element being configured and arranged to modify a point spread fun...
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WO/2024/101390A1 |
A resist composition containing a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) (In the formula, R is a hydrogen atom, a C1-5 alkyl group, or a C1-5 halogenated alkyl gro...
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WO/2024/101220A1 |
The present invention addresses the problem of providing a curable resin composition which is capable of forming a cured product having a high hardness even if post-baking is carried out at a low temperature of 150°C or less. The pres...
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WO/2024/099744A1 |
Disclosed is a method for determining at least one set of correction weights to correct metrology data is disclosed. The method comprises obtaining first and second metrology data relating respectively to a first layer and a second layer...
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WO/2024/100964A1 |
Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, ...
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WO/2024/101181A1 |
The present invention pertains to a photosensitive resin composition characterized by comprising (A) a resin having a (meth)acryloyl group, (B) a photo-radical generator, and (C) a polymer obtained through copolymerization between an alk...
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WO/2024/101116A1 |
The purpose of the present invention is, in order to suitably control the torque of a motor, to provide a means that, using a motor control unit in which the resolution of a digital value that can be outputted is determined, sets the tor...
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WO/2024/099957A1 |
An optical system (100) for a lithography apparatus (1) comprising a plurality of optical elements, with a number N1 of arrangements (210-260), where N1 ≥ 1, wherein each of the N1 arrangements (210-260) comprises at least one actuator...
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WO/2024/100764A1 |
The present disclosure pertains to a photosensitive resin composition which contains: a base resin containing a maleimide compound; a crosslinking agent; and a photopolymerization initiator. The maleimide compound is the reaction product...
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WO/2024/101044A1 |
Provided are a resist composition in which the temporal stability during storage is increased and a decrease in fine resolution after storage is reduced, a resist pattern formation method using said resist composition, and a compound use...
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WO/2024/099640A1 |
A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential (31) wall having a first height; a first drain (12) radially outwards of the first circumferential wall and configured ...
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WO/2024/099795A1 |
A production control method controls the operation of a microlithographic projection exposure apparatus comprising a projection lens for imaging a part of a pattern arranged in the region of an object plane of the projection lens into an...
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WO/2024/099686A1 |
Systems, methods, and computer software are disclosed for determining overlays. One method can include performing a component analysis on a set of Scanning Electron Microscope (SEM) images to obtain coefficients of one or more selected c...
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WO/2024/099636A1 |
The invention relates to an assembly for a microlithographic projection exposure apparatus, comprising a sensor frame (101, 201, 301, 401), on which sensors (102, 202, 302, 402) are arranged for the purpose of measuring the position of o...
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WO/2024/099676A1 |
The invention relates to a method for correcting local elevations (40) on the surface, having a reflective coating (27), of an optical element (25) for EUV microlithography. The method comprises the steps of: measuring the surface of an ...
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WO/2024/101166A1 |
Provided is a substrate processing method. The method comprises a step (a) for providing a substrate having a base film, and a step (b) for forming a metal-containing resist film on the base film by using a polyfunctional compound and a ...
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WO/2024/102640A1 |
A radiation source includes a chamber, a window, and a conduit system. The chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the chamber and a...
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WO/2024/101411A1 |
Disclosed is a curable composition for organic EL elements, the curable composition containing (A) a polymer that comprises a structural unit derived from a compound having an acidic group, and (B) a photosensitive compound, wherein: the...
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WO/2024/099710A1 |
An apparatus for training a machine learning model for inspecting a wafer includes a memory storing a set of instructions and at least one processor configured to execute the set of instructions to cause the apparatus to perform: inputti...
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WO/2024/101219A1 |
The present invention addresses the problem of providing a colored curable resin composition with which it is possible to form a color filter that exhibits superior solvent resistance. The present invention relates to a colored curable...
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WO/2024/101266A1 |
Provided are: a cured product obtained by curing a resin composition comprising a resin which is at least one selected from the group consisting of polyimides and precursors thereof and which has a polymerizable group, and a photopolymer...
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WO/2024/100848A1 |
This gas laser device comprises:a chamber device provided with an electrode in the interior thereof, in which a laser gas is sealed, the chamber device emitting, to the outside via a window, light that is generated from the laser gas due...
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WO/2024/101378A1 |
Provided are: an active-ray-sensitive or radioactive-ray-sensitive resin composition comprising a resin (A) and a salt (B) having a cation radical structure; an active-ray-sensitive or radioactive-ray-sensitive film in which the active-r...
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WO/2024/101164A1 |
The present invention provides a resist composition which is capable of imparting a coating film that is obtained therefrom with excellent leveling properties, while being capable of suppressing the occurrence of a defect in the surface ...
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WO/2024/099823A1 |
A linear motor motion system is configured to move an object and comprises: a magnetic track; a coil unit, including a plurality of coils wound about respective ferromagnetic cores, a bearing configured to guide the coil unit along the m...
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WO/2024/096069A1 |
[Problem] The purpose of the present invention is to provide a resist underlayer film-forming composition that can further improve properties of a resist underlayer film, such as curing properties, heat resistance, etching resistance, pl...
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WO/2024/094365A1 |
The invention provides a positioning system for positioning a movable object, comprising: multiple actuators arranged to move the movable object in one or more degrees of freedom, wherein the multiple actuators comprise more actuators th...
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WO/2024/097023A1 |
One or more optical images of a portion of a semiconductor wafer are obtained. The one or more optical images show a first structure in a first process layer and a second structure in a second process layer. The one or more optical image...
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WO/2024/094385A1 |
Systems, methods, and computer software are disclosed for reducing wafer patterning errors caused by a mask device. One method (300) can include obtaining a first mask design (310) having a first portion (324) associated with an optimize...
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WO/2024/094386A1 |
A cooling system for a linear actuator is described. The system includes wound electrical coils and cooling plates. The electrical coils are configured to be energized to provide an electromagnetic force for the linear actuator. The elec...
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WO/2024/095868A1 |
The present invention provides a resist composition which generates an acid by being exposed to light, and the solubility of which in a developer solution is changed by the action of an acid. This resist composition contains: a resin com...
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WO/2024/094360A1 |
The invention relates to an optical system and to a method for operating an optical system, in particular in a microlithographic projection exposure apparatus. An optical system according to the invention has at least one optical element...
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WO/2024/095884A1 |
A resin composition containing compound B1 represented by formula (1-1) and at least one resin selected from the group consisting of a polyimide and a polyimide precursor having a polymerizable group, wherein the compound B1 has an ethyl...
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WO/2024/094354A1 |
The invention relates to an adaptive mirror (100) for a microlithographic projection exposure system (600, 700), having a mirror substrate (101), having an optical active surface (102) and a reflective layer system (103) for reflecting e...
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WO/2024/095885A1 |
A resin composition comprising at least one resin selected from the group consisting of polyimides and precursors thereof, a polymerizable compound, and a photopolymerization initiator, wherein the polymerizable compound has an ethylenic...
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WO/2024/096229A1 |
A patterning method according to one embodiment of the present invention comprises the steps of: forming a first photoresist layer on a substrate; performing first segmented exposure on the first photoresist layer with first exposure ene...
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WO/2024/094374A1 |
A control apparatus includes: a power controller configured to control an amount of energy in an exposure beam; and a tracking module configured to: determine an amount of accumulated energy of a region that moves through the exposure be...
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WO/2024/095927A1 |
The present disclosure provides a photosensitive resin composition which achieves high copper adhesion, while suppressing the occurrence of a copper void at the interface between a copper layer and a resin layer after a high temperature ...
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WO/2024/091025A1 |
The present invention relates to a polyimide resin, a negative-type photosensitive resin composition comprising same, and an electronic device comprising an organic insulating film or a photosensitive pattern, formed from the negative-ty...
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WO/2024/091470A1 |
Methods for forming an EUV photoresist hard mask are provided. The method includes treating a metal-rich layer on a substrate with a reductive plasma to form a metallic surface on the metal-rich layer, the metal-rich layer having a top p...
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WO/2024/088904A1 |
A microlithographic projection exposure apparatus comprises a mask holder (20) for holding a mask (18), a substrate holder (26) for holding a substrate (24), and a projection lens (22) having a plurality of optical elements (R1-R4) for i...
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WO/2024/090567A1 |
Provided is a negative photosensitive resin composition comprising: a polyimide (A) represented by formula (1) {in formula (1), A denotes a structure derived from a tetracarboxylic dianhydride, B denotes a structure derived from a diamin...
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WO/2024/089737A1 |
In order to achieve a dichroic mirror having a large area, this synthetic optical element comprises: a plurality of optical elements each provided with a first substrate and a dichroic film; and a second substrate, wherein the plurality ...
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WO/2024/088871A1 |
The invention relates to a projection exposure system (1, 101) for semiconductor lithography, comprising at least one optical element (Mx, 117), wherein at least one actuator (44) for deforming an optical active surface (33) of the optic...
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WO/2024/090460A1 |
Provided are: a resin composition which contains at least one resin selected from the group consisting of cyclized resins and precursors thereof and a compound A represented by formula (A-1) and having a molecular weight of at most 380; ...
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