Title:
プラズマ処理の均一性のためのステップのある上部電極
Document Type and Number:
Japanese Patent JP2004511906
Kind Code:
A
Abstract:
A plasma discharge electrode having a front surface with a central portion thereof including gas outlets discharging a process gas which forms a plasma and a peripheral portion substantially surrounding the gas outlets. The peripheral portion has at least one step for controlling a density of the plasma formed by the electrode. The electrode can be used as the grounded upper electrode in a parallel plate plasma processing apparatus such as a plasma etching apparatus. The geometric features of the step and of a corresponding edge ring on the lower electrode can be varied to achieve the desired etch rate profile across a wafer surface.
Inventors:
Dindosa, Razinder
Srinivasan, Mukundo
Eppler, Aaron
Lens, erik
Srinivasan, Mukundo
Eppler, Aaron
Lens, erik
Application Number:
JP2002535154A
Publication Date:
April 15, 2004
Filing Date:
October 10, 2001
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01J37/32; H01L21/3065; (IPC1-7): H01L21/3065; H01J37/32
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura