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Title:
集積回路メモリーセル及びその製法
Document Type and Number:
Japanese Patent JP2007535132
Kind Code:
A
Abstract:
An integrated circuit memory cell includes a combined first capacitor electrode and first transistor source/drain, a second capacitor electrode, a capacitor dielectric between the first and second electrodes, and a vertical transistor above and including the first source/drain. The second source/drain may be included in a digit line inner conductor connecting a digit line to a transistor channel of the vertical transistor. The channel may include a semiconductive upward extension of the combined first electrode and first source/drain. The memory cell may be included in an array of a plurality of such memory cells wherein the second electrode is a common electrode among the plurality. The memory cell may provide a straight-line conductive path between the first electrode and a digit line, the path extending through the vertical transistor.

Inventors:
Patterson, Alexander
Application Number:
JP2006545426A
Publication Date:
November 29, 2007
Filing Date:
December 15, 2004
Export Citation:
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Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/8242; H01L27/10; H01L27/108; H01L21/02; H01L27/12
Domestic Patent References:
JPS62274771A1987-11-28
JPS6329571A1988-02-08
JPS6070758A1985-04-22
JP2001102549A2001-04-13
JPS6173366A1986-04-15
JP2003179161A2003-06-27
JPS61234066A1986-10-18
JPS5956763A1984-04-02
JPH06216337A1994-08-05
JPH05160408A1993-06-25
Attorney, Agent or Firm:
Nomura Yasuhisa
Takenori Hiroe
Takanobu Takekawa
High Shinichi Ara
Tsutomu Nishio