Title:
PLASMA TREATMENT METHOD
Document Type and Number:
Japanese Patent JP2019079837
Kind Code:
A
Abstract:
To improve the yield of product, when performing plasma treatment of a substrate held on a holding sheet.SOLUTION: A plasma treatment method includes a first step of preparing a transfer carrier including a holding sheet, and a frame placed in the outer peripheral region of the holding sheet, a second step of sticking a substrate to the internal region of the holding sheet other than the outer peripheral region, and making the transfer carrier hold the substrate, a third step of bending the internal region of the holding sheet, a fourth step of mounting the transfer carrier on a stage after the third step, and bringing the substrate into contact with the stage via the holding sheet, and a fifth step of plasma treatment of the substrate after the fourth step, where the internal region of the holding sheet comes into contact with the stage earlier than the outer peripheral region, in the fourth step.SELECTED DRAWING: Figure 3
Inventors:
OKITA SHOGO
HARIGAI ATSUSHI
ITO AKIHIRO
MATSUBARA ISAYUKI
HARIGAI ATSUSHI
ITO AKIHIRO
MATSUBARA ISAYUKI
Application Number:
JP2017203058A
Publication Date:
May 23, 2019
Filing Date:
October 20, 2017
Export Citation:
Assignee:
PANASONIC IP MAN CORP
International Classes:
H01L21/3065; H01L21/301; H01L21/683
Domestic Patent References:
| JP2016195151A | 2016-11-17 | |||
| JP2013004666A | 2013-01-07 | |||
| JP2014513868A | 2014-06-05 | |||
| JP2016195150A | 2016-11-17 |
Attorney, Agent or Firm:
Kawasaki/Hashimoto Patent Office
Shinichi Kawasaki
Yuko Tsumura
Shozo Yamashita
Kaoru Hashimoto
Shinichi Kawasaki
Yuko Tsumura
Shozo Yamashita
Kaoru Hashimoto