Title:
DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND PROGRAM
Document Type and Number:
Japanese Patent JP2021039476
Kind Code:
A
Abstract:
To provide a defect inspection device, a defect inspection method, and a program capable of performing defect inspection with high accuracy.SOLUTION: A defect inspection device has a first image acquisition unit, a second image acquisition unit, a generation unit, and an estimation unit. The first image acquisition unit acquires a first image of an inspection target created by a first creation method. The second image acquisition unit acquires a second image obtained by photographing the inspection target. The generation unit extracts index data similar to the first image with reference to a database in which a third image created by the first creation method or the index data that is a feature quantity obtained by the third image is associated with correct answer data that is an image determined to have no defect in a past inspection, acquires the correct answer data associated with the extracted index data, and generates a reference image based on the acquired correct answer data. The estimation unit estimates a pixel associated with a defective part on the inspection target by comparing the reference image with the second image.SELECTED DRAWING: Figure 2
Inventors:
HIRAI RYUSUKE
SUGIURA KYOKA
SAKATA KOSHIN
TANIZAWA AKIYUKI
SUGIURA KYOKA
SAKATA KOSHIN
TANIZAWA AKIYUKI
Application Number:
JP2019159396A
Publication Date:
March 11, 2021
Filing Date:
September 02, 2019
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
G06T7/00; G01N21/956
Domestic Patent References:
| JP2019086590A | 2019-06-06 | |||
| JP2018116364A | 2018-07-26 | |||
| JP2014002144A | 2014-01-09 | |||
| JP2011163855A | 2011-08-25 | |||
| JP2011007553A | 2011-01-13 |
Other References:
淺海 徹哉、外３名: "“自己参照に基づくパターン欠陥検査法”", 情報処理学会研究報告, vol. 2009, no. 29, JPN6022040676, 6 March 2009 (2009-03-06), JP, pages 287 - 292, ISSN: 0004887247
Attorney, Agent or Firm:
Shiga International Patent Office