Title:
POLISHING PAD AND POLISHING PAD MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2021137893
Kind Code:
A
Abstract:
To provide a polishing pad that can prevent a protrusion of a window due to dressing and abrasion during polishing processing and occurrence of scratches due to the protrusion, and reduce the risk of peeling off of a transparent resin member.SOLUTION: A polishing pad 1 includes first layers having a first through-hole 5, second layers 3 having a second through-hole 6, which are higher in hardness than the first layers, and a transparent resin member 4. The first layer 2 has a polishing surface 7 for polishing an object to be polished, and the second layer 3 is made to adhere to a surface at the opposite side of the second polishing surface 7 of the first layer 2. When viewing the polishing pad 1 through the polishing surface side 7, the first through-hole 5 and the second through-hole 6 overlap with each other at least partially, and the transparent resin member 4 is arranged in the second through-hole 6 and is made to adhere to a side of the second through-hole 6.SELECTED DRAWING: Figure 1
Inventors:
TAKAGI MASATAKA
TATENO TEPPEI
TANAKA KEISUKE
TATENO TEPPEI
TANAKA KEISUKE
Application Number:
JP2020035683A
Publication Date:
September 16, 2021
Filing Date:
March 03, 2020
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/22; B24B37/013; B24B37/24; B24B37/26; H01L21/304
Attorney, Agent or Firm:
Shinichiro Tanaka
▲吉▼田 和彦
Hiroyuki Suda
Kazuo Yamazaki
Satsuki Ichikawa
Hironobu Hattori
Yasushi Sasaki
▲吉▼田 和彦
Hiroyuki Suda
Kazuo Yamazaki
Satsuki Ichikawa
Hironobu Hattori
Yasushi Sasaki