Title:
レベンソン型位相シフトマスク及びその製造方法
Document Type and Number:
Japanese Patent JP4254603
Kind Code:
B2
Abstract:
A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.
Inventors:
Yousuke Kojima
Toshio Konishi
Keiji Tanaka
Masao Otaki
Jun Sasaki
Toshio Konishi
Keiji Tanaka
Masao Otaki
Jun Sasaki
Application Number:
JP2004128043A
Publication Date:
April 15, 2009
Filing Date:
April 23, 2004
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
G03F1/30; G03F1/36; G03F1/68; G03F7/20; H01L21/027
Domestic Patent References:
| JP5011433A |
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto