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Patent Searching and Data


Title:
回路装置およびその製造方法
Document Type and Number:
Japanese Patent JP4785139
Kind Code:
B2
Abstract:
Provided are a hybrid integrated circuit device in which fine patterns can be formed while current-carrying capacitances are ensured, and a method of manufacturing the same. The hybrid integrated circuit device of the present invention includes conductive patterns formed on a front surface of a circuit substrate and circuit elements electrically connected respectively to the conductive patterns. The conductive patterns include a first conductive pattern and a second conductive pattern formed more thickly than the first conductive pattern. The second conductive pattern includes a protruding portion protruding in a thickness direction thereof.

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Inventors:
Yusuke Igarashi
Takasagi Sadamichi
Motoichi Nezu
Takaya Kusobe
Application Number:
JP2006510320A
Publication Date:
October 05, 2011
Filing Date:
February 18, 2005
Export Citation:
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Assignee:
ON Semiconductor Trading Limited
International Classes:
H01L23/14; H01L23/433; H01L25/16; H05K1/02; H01L21/56; H05K1/05; H05K3/06; H05K3/28
Domestic Patent References:
JPH0496258A1992-03-27
JP2001177022A2001-06-29
JPS63260198A1988-10-27
JPH0254265U1990-04-19
JP2001217511A2001-08-10
JPH09130018A1997-05-16
JPH01266786A1989-10-24
JP2001196738A2001-07-19
JP2002198619A2002-07-12
Attorney, Agent or Firm:
Takashi Okada
Yoshitaka Okada
Naoko Shiraishi