To reduce oscillation or ringing of deflection voltage.
The electron beam equipment comprises an electron gun 201 irradiating an electron beam 200, a first shaping deflector 212 and a second shaping deflector 214 for deflecting the electron beam 200 irradiated from the electron gun 201, a deflection amplifier 324 for applying a deflection voltage in parallel with the first shaping deflector 212 and a second shaping deflector 214, and a damping resistor 230 connected with a single core cable 220 for connecting the first shaping deflector 212 and the second shaping deflector 214 and applying a deflection voltage. Since an undulation component can be attenuated, ringing and oscillation are reduced and response characteristics can be enhanced. As a result, precision of deflection can be enhanced. Furthermore, since response characteristics can be enhanced by reducing ringing and oscillation, settling time can be shortened resulting in shortening of the writing time.
COPYRIGHT: (C)2007,JPO&INPIT
Kenji Ohtoshi
Hiroki Mizoguchi
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