Title:
成膜装置、基板処理装置及びプラズマ発生装置
Document Type and Number:
Japanese Patent JP5644719
Kind Code:
B2
Abstract:
A disclosed film deposition apparatus which forms a film on a substrate inside a vacuum chamber including a turntable having a substrate mounting area, includes an antenna facing the substrate mounting area for converting the plasma generating gas to plasma, a Faraday shield intervening between the antenna and the substrate to prevent an electric field of an electromagnetic field from passing therethrough, the Faraday shield including slits arranged on the conductive plate parallel to the antenna, the slits being opened on the conductive plate in perpendicular to a direction of arranging the slits to enable a magnetic field to reach the substrate, a window opened in an area of the conductive plate surrounded by the slits, an inner conductive path between the slits and the window and grounded, and an outer conductive path on a side opposite to the window relative to the slits and surrounds the slits.
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Inventors:
加藤 寿
小林 健
牛窪 繁博
相川 勝芳
小林 健
牛窪 繁博
相川 勝芳
Application Number:
JP2011182918A
Publication Date:
December 24, 2014
Filing Date:
August 24, 2011
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/31; C23C16/507; C23C16/509; H05H1/46
Attorney, Agent or Firm:
Toshio Inoue