Title:
表面沈着物の除去および化学蒸着(CVD)チャンバーの内部の内部表面の不動態化方法
Document Type and Number:
Japanese Patent JP2009503905
Kind Code:
A
Abstract:
The present invention relates to plasma cleaning methods for removing surface deposits from a surface, such as the interior of a depositions chamber that is used in fabricating electronic devices. The present invention also provides gas mixtures and activated gas mixtures which provide superior performance in removing deposits from a surface. The methods involve activating a gas mixture comprising a carbon or sulfur source, NF3, and optionally, an oxygen source to form an activated gas, and contacting the activated gas mixture with surface deposits to remove the surface deposits wherein the activated gas mixture acts to passivate the interior surfaces of the apparatus to reduce the rate of surface recombination of gas phase species.
Inventors:
Herbert H. Sawin
Bye Bo
Anjujin
Bye Bo
Anjujin
Application Number:
JP2008525139A
Publication Date:
January 29, 2009
Filing Date:
August 02, 2006
Export Citation:
Assignee:
MASSACHUSETTS INSTITUTE OF TECHNOLOGY
International Classes:
H01L21/31; C23C16/44; C23C16/50
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe