Title:
基板処理装置
Document Type and Number:
Japanese Patent JP5819762
Kind Code:
B2
Abstract:
A substrate processing apparatus includes a substrate holding means that holds a substrate horizontally, a substrate rotating means that rotates a substrate held by the substrate holding means about a vertical rotation axis passing through the substrate, a discharging member that discharges a processing liquid toward the substrate, and a high-temperature processing liquid pipe that supplies a processing liquid of a temperature higher than that of the discharging member to the flow passage. The discharging member includes a plurality of discharge ports respectively disposed at a plurality of positions different in distance from the rotation axis and a flow passage connected sequentially to the plurality of discharge ports in order from outside to inside. The discharging member discharges a processing liquid supplied from the flow passage to the plurality of discharge ports from the plurality of discharge ports toward the substrate.
Inventors:
Atsushi Miura
Application Number:
JP2012078181A
Publication Date:
November 24, 2015
Filing Date:
March 29, 2012
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/306; B08B3/02; H01L21/304
Domestic Patent References:
| JP11165114A | ||||
| JP2007258274A | ||||
| JP2009021324A | ||||
| JP2010192875A |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Masahide Yasuda
Mio Kawasaki
Masahide Yasuda