Title:
ＥＵＶシステムに用いる反射光学素子
Document Type and Number:
Japanese Patent JP5829389
Kind Code:
B2
Abstract:
A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
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Inventors:
Holger Keeley
Michelle Maile
Villi Andel
Hubert Holderer
Anton Lengel
Michelle Maile
Villi Andel
Hubert Holderer
Anton Lengel
Application Number:
JP2010192235A
Publication Date:
December 09, 2015
Filing Date:
August 30, 2010
Export Citation:
Assignee:
Carl Zeiss Laser Optics Game Behr
International Classes:
G02B5/08; H01L21/027
Domestic Patent References:
| JP11326598A | ||||
| JP2004095993A | ||||
| JP2005004145A | ||||
| JP2007025136A | ||||
| JP10335538A | ||||
| JP5119208A | ||||
| JP2007011333A |
Attorney, Agent or Firm:
Kenji Sugimura
Tatsuya Sawada
Groundwork Kenichi
Tatsuya Sawada
Groundwork Kenichi