Title:
結晶緩和構造に基づく半導体発光デバイス
Document Type and Number:
Japanese Patent JP5932817
Kind Code:
B2
Inventors:
Barkenende, Abraham Rudolph
Fels Fullen, Marcus Anthony
Iming, george
Fels Fullen, Marcus Anthony
Iming, george
Application Number:
JP2013537226A
Publication Date:
June 08, 2016
Filing Date:
October 20, 2011
Export Citation:
Assignee:
KONINKLIJKE PHILIPS N.V.
International Classes:
H01L33/08; H01L33/04; H01L33/32; H01S5/343; H01S5/42
Domestic Patent References:
| JP2009049209A | ||||
| JP2009176906A | ||||
| JP2003158296A | ||||
| JP2008016847A | ||||
| JP2009009978A | ||||
| JP2009206449A |
Other References:
L.Jay Guo,"Nanoimprint Lithography: Methods and Material Requirements",Advanced Materials,2007年 1月25日,Volume 19, Issue 4,pp.495-513
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki
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