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Title:
改善されたオフ速度(off−rate)を持つアプタマーを生成するための方法
Document Type and Number:
Japanese Patent JP6407195
Kind Code:
B2
Abstract:
The present disclosure describes improved SELEX methods for producing aptamers that are capable of binding to target molecules and improved photoSELEX methods for producing photoreactive aptamers that are capable of both binding and covalently cross linking to target molecules. Specifically, the present disclosure describes methods for producing aptamers and photoaptamers having slower dissociation rate constants than are obtained using prior SELEX and photoSELEX methods. The disclosure further describes aptamers and photoaptamers having slower dissociation rate constants than those obtained using prior methods. In addition, the disclosure describes aptamer constructs that include a variety of functionalities, including a cleavable element, a detection element, and a capture or immobilization element.

Inventors:
Jichi, Dominique
Will Cox, Sheri Kay
Bock, chris
Schneider, Daniel Jay
Eaton, Bruce
Gold, rally
Application Number:
JP2016095782A
Publication Date:
October 17, 2018
Filing Date:
May 12, 2016
Export Citation:
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Assignee:
SomaLogic, Inc.
International Classes:
C12N15/115
Domestic Patent References:
JP2005517456A
JP11506107A
JP2005194257A
JP2004307464A
Foreign References:
WO2006096754A1
Other References:
FEBS Lett., 2007.05(online), Vol.581, pp.2497-2502
Nucleic Acids Symposium Series, 1997, No.37, pp.201-202
Bioorg. Med. Chem. Lett., 1998, Vol.8, pp.2285-2290
Proc. Natl. Acad. Sci. USA, 2002, Vol.99, No.18, pp.11616-11621
Anal. Chem., 2006, Vol.78, pp.3171-3178
Attorney, Agent or Firm:
Shinjiro Ono
Yasushi Kobayashi
Shigeo Takeuchi
Osamu Yamamoto
Hiroko Ejiri